A multi-parameter comprehensive optimization film system design method to improve the performance of ultrafast laser thin films
An ultrafast laser and film system design technology, applied in optics, optical components, instruments, etc., can solve problems such as poor accuracy of algorithms, low efficiency of needle-type optimization algorithms, and film structure that does not meet the requirements of the preparation process.
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Embodiment 1
[0032] Embodiment 1: Design bandwidth 700-900nm, dispersion amount-150fs 2 , The incident angle is 5 degrees, and the reflectivity is greater than 99.5%.
[0033] The detailed steps are as follows:
[0034] 1) Use the film thickness modulation method for initial design, SiO 2 As a low refractive index material, Ta 2 o 5 As a high refractive index material, the initial film structure is as follows figure 2 shown. In the 700-900nm range, set the Group Delay Dispersion (GDD) target to -150fs2 and the Reflectance target to 100%. First, the variablemetric local optimization method is used to quickly optimize the initial film structure, and the optimized structure obtained is as follows image 3 As shown, the spectrum and dispersion curve are as Figure 4 shown. At this point, a set of design results close to the design goal has been obtained through one-step optimization;
[0035] 2) The termination condition of the stitch optimization algorithm is set to be that the tota...
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