Unlock instant, AI-driven research and patent intelligence for your innovation.

A multi-parameter comprehensive optimization film system design method to improve the performance of ultrafast laser thin films

An ultrafast laser and film system design technology, applied in optics, optical components, instruments, etc., can solve problems such as poor accuracy of algorithms, low efficiency of needle-type optimization algorithms, and film structure that does not meet the requirements of the preparation process.

Active Publication Date: 2022-04-05
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to solve the problems of poor accuracy of local optimization algorithm, low efficiency of needle optimization algorithm, and the final film structure does not meet the actual preparation process requirements in the ultrafast laser thin film design process, and proposes a comprehensive method that is more suitable for the design of dispersion mirrors. optimization method

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A multi-parameter comprehensive optimization film system design method to improve the performance of ultrafast laser thin films
  • A multi-parameter comprehensive optimization film system design method to improve the performance of ultrafast laser thin films
  • A multi-parameter comprehensive optimization film system design method to improve the performance of ultrafast laser thin films

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0032] Embodiment 1: Design bandwidth 700-900nm, dispersion amount-150fs 2 , The incident angle is 5 degrees, and the reflectivity is greater than 99.5%.

[0033] The detailed steps are as follows:

[0034] 1) Use the film thickness modulation method for initial design, SiO 2 As a low refractive index material, Ta 2 o 5 As a high refractive index material, the initial film structure is as follows figure 2 shown. In the 700-900nm range, set the Group Delay Dispersion (GDD) target to -150fs2 and the Reflectance target to 100%. First, the variablemetric local optimization method is used to quickly optimize the initial film structure, and the optimized structure obtained is as follows image 3 As shown, the spectrum and dispersion curve are as Figure 4 shown. At this point, a set of design results close to the design goal has been obtained through one-step optimization;

[0035] 2) The termination condition of the stitch optimization algorithm is set to be that the tota...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
reflectanceaaaaaaaaaa
Login to View More

Abstract

A multi-parameter comprehensive optimization film system design method to improve the performance of ultrafast laser thin films, based on the existing local optimization algorithm and needle optimization algorithm, combining the efficiency of the local optimization algorithm and the accuracy of the needle optimization algorithm, proposed A comprehensive optimization method that is more suitable for the design of dispersive mirrors. This method intersects the use of local optimization algorithm and needle optimization algorithm, and disturbs the evaluation function through thin-layer optimization and thick-layer optimization, effectively avoiding the occurrence of film structure that does not meet the actual preparation process requirements during the automatic optimization process. The comprehensive optimization method can design a dispersion mirror with high reflection and low dispersion oscillation in the required wavelength band, and automatically eliminate extremely thin and extremely thick layers, which greatly reduces the difficulty of film preparation.

Description

technical field [0001] The invention belongs to the field of ultrafast laser thin films, in particular to a multi-parameter comprehensive optimization method for improving the performance of ultrafast laser thin films. Background technique [0002] The dispersive mirror must provide continuous high reflectivity and smooth dispersion curve in the spectral range of the specified width. In order to meet these two requirements at the same time, the evaluation function F of the dispersive mirror is usually defined as: [0003] [0004] In the formula, i=1,..., n is the number of target values, R target , GDD target is the target value of reflectivity and group delay dispersion at the wavelength point, R λi and GDD λi is the actual value obtained at the wavelength point during the optimization process of reflectivity and GDD, v i and w i is the weight corresponding to reflectivity and GDD, and k is the power value. Film system design software generally determines whether ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G02B27/00G02B1/10
CPCG02B27/0012G02B1/10
Inventor 王胭脂张宇晖贺洪波陈瑞溢王志皓陈昌许贝贝朱晔新晋云霞邵宇川易葵邵建达
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI