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Apparatus for monitoring gas component of gas laser

A technology of gas laser and gas composition, which is applied in the direction of exposure devices, optics, and optomechanical equipment in photolithography, can solve problems such as instability, laser output reduction, and laser beam light output instability, and achieve the goal of ensuring output stability Effect

Pending Publication Date: 2021-02-26
车桐镐
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  • Abstract
  • Description
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Problems solved by technology

[0005] Due to these impurities, the vibration efficiency of the gas laser is reduced, the laser output is reduced or unstable, and the profile of the laser beam is changed.
In this way, if the light output of the laser beam becomes unstable or the profile changes, it becomes a big problem that can only increase the defect rate of the semiconductor manufacturing process

Method used

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  • Apparatus for monitoring gas component of gas laser
  • Apparatus for monitoring gas component of gas laser

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Embodiment Construction

[0025] Hereinafter, preferred embodiments will be described with reference to the drawings for a more concrete understanding of the present invention.

[0026] figure 1 It is a diagram schematically showing a gas laser generating chamber for explaining a gas laser gas component monitoring device according to an embodiment of the present invention, figure 2 It is a diagram schematically showing the configuration of a gas component monitoring device using a gas laser according to an embodiment of the present invention.

[0027] refer to figure 1 and figure 2 It can be seen that the gas laser gas component monitoring device according to the embodiment of the present invention can be attached to the gas laser generating chamber for use, and this overall system 10 includes the gas laser generating chamber and the gas laser gas component monitoring device.

[0028] Here, it should be clarified that the term “gas laser gas composition monitoring” means monitoring the composition...

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Abstract

The present invention relates to an apparatus for monitoring a gas laser. The present invention is connected to a gas laser generation chamber so as to be capable of receiving two types of gases fromthe gas laser generation chamber, and monitors components of the two types of gases accommodated in a reaction space of a gas laser emitting chamber, thereby enabling the insertion or generation of unnecessary substances in the gas laser generation chamber to be quickly identified and measurements responding thereto to be taken. Therefore, a technology capable of ensuring the stability of a laserbeam output is disclosed.

Description

technical field [0001] The present invention relates to a gas laser gas composition monitoring device, and in more detail, to a gas laser gas composition monitoring device capable of monitoring the composition of a different gas existing in a chamber that realizes laser generation. Background technique [0002] In the semiconductor or display device manufacturing process, in the exposure process, an exposure device is used to selectively irradiate light to a photosensitive film in a predetermined pattern to form a pattern. Exposure equipment requires the high precision required for the manufacture of semiconductor devices and displays, so laser light is used as the light source. [0003] In the case of an exposure device using laser light as a light source, a gas laser generating chamber is provided, which is filled with a specific gas inside, and laser light is generated according to the interaction between the gases excited by applying electrodes, and directed to the insid...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G03F9/00
CPCG03F7/20G03F9/00G03F7/70483G03F7/70025G03F9/7057
Inventor 车桐镐
Owner 车桐镐
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