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Baffle device, film forming device, film forming method, and method for manufacturing electronic equipment

A technology of baffle device and film forming device, which is applied in semiconductor/solid-state device manufacturing, circuits, electrical components, etc., can solve problems such as process delay and achieve high reliability.

Pending Publication Date: 2021-03-05
CANON TOKKI CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

That is, the process progress is greatly delayed

Method used

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  • Baffle device, film forming device, film forming method, and method for manufacturing electronic equipment
  • Baffle device, film forming device, film forming method, and method for manufacturing electronic equipment
  • Baffle device, film forming device, film forming method, and method for manufacturing electronic equipment

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Embodiment 1

[0047] refer to Figure 1 ~ Figure 3 , the film forming apparatus according to the embodiment of the present invention and the shutter device (shutter mechanism) included in the film forming apparatus will be described. The film forming apparatus of this embodiment is a film forming apparatus for forming a thin film on a substrate by vacuum evaporation.

[0048] The film forming apparatus of this embodiment is used for vacuum deposition on substrates (including substrates on which laminates are formed) ) on which a thin film (a material layer formed of an organic film, a metal film, etc.) is deposited to form a desired pattern. Any material such as glass, resin, and metal can be selected as the material of the substrate, and any material such as organic material or inorganic material (metal, metal oxide, etc.) can also be selected as the vapor deposition material. More specifically, the film forming apparatus of this embodiment is preferably used in the manufacture of electr...

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Abstract

The invention provides a baffle device which is high in operation stability and reliability and serves as a baffle device in a film forming device. A drive mechanism for causing a shutter to slide isprovided with a support base; a driving force generation part that generates a force acting on the shutter in the direction of the sliding movement; and a guide part which supports one end side and the other end side of the baffle plate in a direction orthogonal to the sliding direction and the width direction while allowing relative movement between the baffle plate and the support table in the width direction at each of the one end side and the other end side of the baffle plate in the width direction of the baffle plate, and which guides the sliding movement of the baffle plate. The width direction of the baffle is orthogonal to the sliding direction of the baffle relative to the supporting table.

Description

technical field [0001] The present invention relates to a film forming apparatus for forming a thin film on an object to be filmed by vacuum deposition, and a shutter device included in the film forming apparatus. Background technique [0002] As a film-forming apparatus for forming a thin film on a substrate as a film-forming object, there is a film-forming apparatus of a vacuum evaporation method that heats a container containing a film-forming material in a vacuum chamber ( Crucible), the film-forming material is evaporated (sublimated or vaporized), sprayed out of the container, and attached and deposited on the surface of the substrate. The film formation was started after the heating of the container was started and the film formation rate was confirmed to be stable with a film formation rate monitor. It is necessary to prevent the film-forming material from adhering to the substrate until the film-forming rate is stabilized. In addition, impurities may be mixed in th...

Claims

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Application Information

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IPC IPC(8): C23C14/24C23C14/54C23C14/04C23C14/26H01L21/67
CPCC23C14/24C23C14/54C23C14/042C23C14/26H01L21/67011H01L21/67207C23C14/564C23C14/12H10K71/164H10K71/00
Inventor 山根彻
Owner CANON TOKKI CORP
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