Cephalometric trace diagram generation method and system

A cephalometric measurement and generation system technology, applied in the computer field, can solve problems such as heavy workload and inability to guarantee the accuracy of tracing maps, and achieve high accuracy, avoid doctor-patient disputes, and reduce workload

Pending Publication Date: 2021-03-26
HEFEI MEIYA OPTOELECTRONICS TECH
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  • Abstract
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Problems solved by technology

[0003] measurement trace Figure 1 Generally, the doctor manually draws the X-ray head. The workload of this process is relatively large, and its accuracy has a lot to do with the doctor's sense of responsibility and technical level. Therefore, the accuracy of the tracing map cannot be guaranteed.

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  • Cephalometric trace diagram generation method and system
  • Cephalometric trace diagram generation method and system
  • Cephalometric trace diagram generation method and system

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Embodiment Construction

[0042] The following describes in detail the embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein the same or similar reference numerals refer to the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary, only used to explain the present invention, and should not be construed as a limitation of the present invention.

[0043] In the description of the present invention, it should be understood that the terms "center", "portrait", "horizontal", "top", "bottom", "front", "rear", "left", "right", " The orientation or positional relationship indicated by vertical, horizontal, top, bottom, inner, outer, etc. is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present invention and The description is simplified rather than indicatin...

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Abstract

The invention provides a cephalometric trace diagram generation method and system. The method comprises the following steps of obtaining a head shadow picture to be measured; identifying the head shadow picture through an identification model to obtain sampling mark points; according to the sampling mark points, obtaining auxiliary mark points through a preset mode, wherein the preset mode comprises a template method; and performing curve fitting on the sampling mark points and the auxiliary mark points to obtain a cephalometric trace diagram. According to the method, the sampling mark pointsare automatically obtained through the identification model, the auxiliary mark points are obtained through the template method, the cephalometric trace diagram can be rapidly generated, and the workload of doctors is greatly reduced; and the accuracy of the cephalometric trace diagram obtained through the sampling mark points and the auxiliary mark points is high, medical risks caused by subjective reasons of the doctors are reduced, and doctor-patient disputes caused by the medical risks are avoided.

Description

technical field [0001] The present invention relates to the technical field of computers, and in particular, to a method and system for generating a cephalometric tracing graph. Background technique [0002] Cephalometric measurement technology was proposed by Broadbent and Hofrath respectively in 1931. It is to first draw a measurement trace on the lateral cephalometric film, and determine the measurement mark points, and then measure the line distance and angle drawn according to these measurement mark points. It is used to measure and analyze the ratio of line to distance to understand the structure of the soft and hard tissues of the skull, jaw, face, and teeth and their relationship with each other. [0003] Measurement trace Figure 1 Generally, the doctor manually delineates the X-ray head. This process requires a lot of work, and its accuracy is closely related to the doctor's responsibility and technical level. Therefore, the accuracy of the trace cannot be guarante...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61B6/00G06T11/20
CPCA61B6/501A61B6/52G06T11/203
Inventor 刘松吴明何琪王瑞曹荣青孟丹丹
Owner HEFEI MEIYA OPTOELECTRONICS TECH
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