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Photoetching machine matching method based on covariance matrix adaptive evolution strategy

A technology of covariance matrix and evolution strategy, applied in optomechanical equipment, microlithography exposure equipment, optics, etc., can solve problems such as high degree of freedom of light source and parameter scale

Active Publication Date: 2021-03-26
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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Problems solved by technology

This method aims at the characteristics of high degree of freedom and large parameter scale of the light source of the free lighting system, and makes full use of the advantages of this method in medium-scale complex optimization problems to improve the accuracy and efficiency of lithography machine matching

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  • Photoetching machine matching method based on covariance matrix adaptive evolution strategy
  • Photoetching machine matching method based on covariance matrix adaptive evolution strategy
  • Photoetching machine matching method based on covariance matrix adaptive evolution strategy

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Embodiment Construction

[0054] The present invention will be further described below in conjunction with the examples and drawings, but the examples should not limit the protection scope of the present invention.

[0055] This embodiment refers to the intensity distribution of the illumination light source of the lithography machine as figure 2 As shown, the brightness value of the white area is 1, the brightness value of the black area is 0, the light source grid is 101×101, and the number of effective light source points within the pupil range is S=8048. The test mask and matching mask used are image 3 In the shown one-dimensional through-pitch line-space pattern mask, the line width of the mask pattern is 45nm, the type is a binary mask, the transmittance of the white area is 1, and the transmittance of the black area is 0. The period of the mask pattern is 120nm, 140nm, 160nm, ..., 1000nm, a total of 45, that is, M=45, and the horizontal line segment marked in the figure is the cross-sectional...

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Abstract

The invention discloses a photoetching machine matching method based on a covariance matrix adaptive evolution strategy. According to the method, the critical dimension of a space image is used as a parameter for describing the imaging performance of a photoetching machine, and the illumination light source of the photoetching machine described in a pixelated manner is optimized through a covariance matrix adaptive evolution strategy, so that high-precision matching between photolithography is realized. According to the invention, the advantages of the covariance matrix adaptive evolution strategy in the medium-scale complex optimization problem are fully utilized, the matching method of the free lighting system photoetching machine is improved, and the matching precision and efficiency ofthe existing method are improved. The method is suitable for matching between immersion photoetching machines with free lighting systems.

Description

technical field [0001] The invention relates to a lithography machine of a free illumination system, in particular to a lithography machine matching method based on a covariance matrix adaptive evolution strategy. Background technique [0002] Photolithography is the core process of integrated circuit manufacturing. In order to reduce economic and time costs, lithography processes are usually developed on reference lithography machines. When the chip is mass-produced, the new photolithography process needs to be applied to the production line. Usually there are multiple lithography machines on a production line, and their models and suppliers may be different, and the performance of different types of lithography machines generally has obvious differences. Even lithography machines of the same model may have large differences in lithography performance including imaging quality due to slight differences in their hardware indicators. Differences between different lithograp...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/705Y02P90/30
Inventor 李思坤陈俞光唐明王向朝陈国栋胡少博
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI