Track control type gravity center adjustable polishing mechanism and polishing method

A trajectory control and polishing mechanism technology, applied in grinding/polishing equipment, manufacturing tools, optical surface grinders, etc., can solve the problems of inability to solve online adjustment, inability to adjust the applied force, etc., to achieve strong practicability and easy operation , reducing the effect of edge effects

Active Publication Date: 2021-04-06
XIAMEN UNIV OF TECH
View PDF9 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this technology can only change the position of the polishing component through the movable joint, thereby changing the position of the force applied to the polishing disc, but cannot adjust the force applied, let alone solve the purpose of online adjustment according to actual processing requirements

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Track control type gravity center adjustable polishing mechanism and polishing method
  • Track control type gravity center adjustable polishing mechanism and polishing method
  • Track control type gravity center adjustable polishing mechanism and polishing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0031] The present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0032] What the present invention discloses is a trajectory control type center-of-gravity adjustable polishing mechanism, such as Figure 1-7 Shown is a preferred embodiment of the present invention. The polishing mechanism includes a polishing disc 1 , a power transmission mechanism 2 , a center of gravity adjustment mechanism 3 and a support mechanism 4 . in:

[0033] The bottom of the polishing disc 1 can be provided with a polishing pad 13. Specifically, the bottom surface of the polishing disc 1 can be pasted with a polishing pad 13 made of materials such as polyurethane or damping cloth as a polishing working surface.

[0034] The power transmission mechanism 2 is used to transmit power for the polishing disc 1, the power transmission mechanism 2 at least includes a motor 21 and a power spindle 22, the lower end of the power ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a track control type gravity center adjustable polishing mechanism and a polishing method. The polishing mechanism comprises a polishing disc, a power transmission mechanism, a gravity center adjusting mechanism and a supporting mechanism. The power transmission mechanism comprises a motor and a power main shaft, and the power main shaft is flexibly connected with the polishing disc. The gravity center adjusting mechanism comprises a track plate, a swing plate and a pressure applying mechanism. The track plate is fixed, and a track groove is formed in the track plate; The swing plate is coupled outside the power main shaft and is provided with a convex block matched with the track groove. The pressure applying mechanism is located between the swing plate and the polishing disc and used for transmitting swing pressure of the swing plate to the polishing disc. According to the track control type gravity center adjustable polishing disc mechanism and the polishing method thereof, the track groove of the track plate is utilized, the edge effect can be reduced by adjusting the gravity center of the polishing disc, and the characteristics of being easy to operate, high in practicability, capable of achieving automatic control and the like are achieved.

Description

technical field [0001] The invention belongs to the technical field of optical element finishing, and relates to a polishing tool and a polishing method for precise polishing of an optical element, in particular to a track-controlled center-of-gravity adjustable polishing mechanism and a polishing method. Background technique [0002] At present, in the field of optical component finishing technology, whether it is classical processing or computer controlled surface shaping technology (CCOS), when processing the edge area of ​​​​the workpiece, due to the reduction of the contact area (because the polishing disc part protrudes from the workpiece) When the stress remains constant, the contact pressure increases, which leads to an increase in the removal amount of the edge of the workpiece and the edge effect of "collapse". This edge effect will seriously hinder the convergence of the workpiece surface shape error, and even reduce the effective diameter of the workpiece . [0...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B24B13/01B24B13/00
CPCB24B13/012B24B13/00
Inventor 柯晓龙邱磊
Owner XIAMEN UNIV OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap