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Device for detecting levelness and perpendicularity of objective table and using method thereof

A technology of stage and verticality, applied in measuring device, measuring inclination, mapping and navigation, etc., can solve problems such as poor verticality, wafer carrier box fit deviation, falling off, etc.

Inactive Publication Date: 2021-04-27
SHANGHAI HUALI MICROELECTRONICS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In view of the shortcomings of the prior art described above, the purpose of the present invention is to provide a device for detecting the level and verticality of the carrier and its use method, which is used to solve the problem of the level of the upper surface of the carrier in the prior art. Poor verticality and poor verticality of the wafer carrier box opening / closing device of the semiconductor equipment machine lead to deviations in the bonding of the wafer carrier box, and even lead to the problem that the wafer carrier box door plate is not closed properly and falls off

Method used

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  • Device for detecting levelness and perpendicularity of objective table and using method thereof
  • Device for detecting levelness and perpendicularity of objective table and using method thereof
  • Device for detecting levelness and perpendicularity of objective table and using method thereof

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Embodiment Construction

[0024] Embodiments of the present invention are described below through specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. The present invention can also be implemented or applied through other different specific implementation modes, and various modifications or changes can be made to the details in this specification based on different viewpoints and applications without departing from the spirit of the present invention.

[0025] see Figure 1 to Figure 5 . It should be noted that the diagrams provided in this embodiment are only schematically illustrating the basic idea of ​​the present invention, and only the components related to the present invention are shown in the diagrams rather than the number, shape and shape of the components in actual implementation. Dimensional drawing, the type, quantity and proportion of each component can be changed arb...

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Abstract

The invention provides a device for detecting the levelness and perpendicularity of an objective table and a using method thereof. A first plane plate is horizontally placed; the second surface plate is fixed at one end of the first surface plate and is perpendicular to the first surface plate; the first plane plate and the second plane plate form a right-angle device with a 90-degree angle; a gradienter for detecting levelness is arranged on the upper surface of the first plane plate; pressure-sensitive distance detection sensors are arranged at the upper left position, the upper right position, the lower left position and the lower right position of the second plane plate respectively; and when the convex part of the pressure-sensitive distance detection sensor is extruded, the extruded pressure-sensitive distance detection sensor displays a retraction distance value. The device provided by the invention can quickly and accurately measure whether the semiconductor equipment is in a normal state or not, and can more accurately test and debug the levelness and verticality of the bearing table, thereby reducing the abnormal risk when the wafer bearing box is opened and closed, and guaranteeing the safety of a wafer.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a device for detecting the level and verticality of a carrier and a method for using the same. Background technique [0002] In 12-inch semiconductor equipment, the stage and the machine table are perpendicular to each other. like figure 1 as shown, figure 1 It is a schematic diagram showing the positional relationship among the machine platform, the object stage and the wafer carrier box in the prior art. The wafer carrier on the stage is placed horizontally on the stage with its sides parallel to the equipment. When the verticality between the stage and the machine deviates from 90°, the parallelism between the wafer carrier and the machine will deviate, and the wafer carrier opening / closing device 01 on the machine and the wafer carrier 02 will fit together There will be a deviation, and there will be a gap between the two. At this time, when the machine end opens o...

Claims

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Application Information

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IPC IPC(8): G01C9/00G01C9/02H01L21/67
CPCG01C9/00G01C9/02H01L21/67242
Inventor 桂纯钦
Owner SHANGHAI HUALI MICROELECTRONICS CORP
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