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A kind of preparation method of controlling the thickness of colloidal crystal film by adjusting humidity

A film thickness and humidity control technology, which is applied to the device for coating liquid on the surface, silicon dioxide, coating, etc., can solve the problems of unavailable film materials and different environmental humidity, and achieve convenient observation and large humidity range , thickness controllable effect

Active Publication Date: 2022-06-14
SOUTHEAST UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when using the traditional vertical deposition method to repeatedly prepare silica colloidal crystal thin films, it is often impossible to obtain thin film materials with uniform thickness. We found that the above results are caused by different environmental humidity.

Method used

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  • A kind of preparation method of controlling the thickness of colloidal crystal film by adjusting humidity
  • A kind of preparation method of controlling the thickness of colloidal crystal film by adjusting humidity
  • A kind of preparation method of controlling the thickness of colloidal crystal film by adjusting humidity

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] Example 1 prepares a low thickness silica colloidal crystal film on a monocrystalline silicon wafer

[0026] Preparation of silica colloidal crystal film growth apparatus such as Figure 2 As shown, (1) add 300mL of pure water to the beaker, place the beaker containing water in a closed transparent plastic box, the plastic box is equipped with a hygrometer, cover the lid, observe the hygrometer in the plastic box after about 12h, at this time the relative humidity in the plastic box reaches 99%.

[0027] (2) The 190nm silica alcohol suspension with ethanol as the solvent with a mass concentration of 5g / L is loaded into the dyeing tank, and the monocrystalline silicon wafer that has been soaked and treated by piranha solution is used as the substrate, and it is inserted vertically into the dyeing cylinder containing the silica ethanol suspension.

[0028] (3) The dyeing cylinder containing the silica ethanol suspension is placed in a transparent plastic box in step (1), and t...

Embodiment 2

[0030] Example 2 prepares a high thickness silica colloidal crystal film on a glass sheet

[0031] (1) Add 400g of anhydrous calcium chloride to the beaker, place the beaker in a closed transparent plastic box, the plastic box is equipped with a hygrometer, cover the lid, observe the hygrometer in the plastic box after about 24h, at this time the relative humidity in the plastic box reaches 5%.

[0032] (2) The 190nm silica alcohol suspension with ethanol as the solvent with a mass concentration of 15g / L is loaded into the dyeing tank, and the glass slide is treated by piranha solution soaking as the base film, and it is inserted vertically into the dyeing cylinder equipped with the silica alcohol suspension.

[0033] (3) Place the dyeing jar containing the silica alcohol suspension in a transparent plastic box in step (1), and remove the glass slide after 7 days.

[0034] The thickness of the glass slides obtained from step (3) above is measured by "interferometry". The result is...

Embodiment 3

[0035] Example 3 prepares a high thickness silica colloidal crystal film on a glass sheet

[0036] (1) Add 400g of anhydrous calcium chloride to the beaker, place the beaker in a closed transparent plastic box, the plastic box is equipped with a hygrometer, cover the lid, observe the hygrometer in the plastic box after about 24h, at this time the relative humidity in the plastic box reaches 5%.

[0037] (2) The 100nm silica alcohol suspension with ethanol as the solvent with a mass concentration of 15g / L is loaded into the dyeing tank, and the glass slide is treated by soaking in piranha solution as the base film, and it is inserted vertically into the dyeing cylinder equipped with the silica alcohol suspension. Measuring the length of the colloidal crystal film and dividing it by the assembly time (7 days), the assembly speed can be calculated to be about 1.8mm / day.

[0038] (3) Place the dyeing jar containing the silica alcohol suspension in a transparent plastic box in step (1)...

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Abstract

The invention discloses a preparation method for controlling the thickness of a colloidal crystal film by adjusting the humidity. The vertical deposition method is used to adjust the relative humidity of the preparation environment by placing water, saturated salt solution or desiccant in a closed box, and the hydrophilic treated The substrate is placed vertically in the prepared alcohol suspension of silica nanoparticles with a certain mass concentration, and the growth container containing the suspension and the substrate is placed in a closed box with controlled humidity, and prepared for 2 to 7 days to obtain a large area of ​​thickness Controllable colloidal silica films. The method for preparing silica colloidal crystal thin films of the present invention solves the problem of uneven quality of thin films prepared in different seasons in the past, and can repeatedly prepare large-area, controllable physical thickness, and stable optical properties without being affected by seasons. Silica colloidal crystal thin film, and explained the necessity of humidity control from principle.

Description

Technical field [0001] The present invention relates to a method for preparing a colloidal crystalline film controlled by adjusting humidity, belonging to the field of self-assembly of nanomaterials. Background [0002] There are many ways to prepare silica colloidal crystalline films, which can be divided into two categories according to whether there is external force involved. Compared with the preparation method with external force participation (such as spin coating method, lifting method, applied electric field deposition method, etc.), although the preparation method without external force participation takes a long time, the prepared thin film has a better crystal structure, which brings better optical properties. [0003] Vertical deposition method is the most common preparation method without external force participation, which is to insert the substrate vertically into the ethanol or aqueous suspension with nanoparticles, and obtain a colloidal crystal film after a per...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03C17/25C01B33/14B05D1/18
CPCC03C17/25C01B33/14B05D1/18
Inventor 钱卫平董傲
Owner SOUTHEAST UNIV
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