Impressing demolding device and method based on Van der Waals force

A demoulding device and demoulding technology, which is applied in decorative art, embossed ornaments, etc., can solve the problems of template and film damage, embossed pattern fracture damage, etc., to achieve high demoulding efficiency, eliminate pressure difference force, and demoulding The effect of good mold pattern integrity

Active Publication Date: 2021-07-09
霖鼎光学(上海)有限公司
View PDF10 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Even if the embossing glue and the template are treated with anti-adhesion, when the embossing glue and the template are separated, due to the effect of differential pressure, the embossing pattern (microstructure) will still be damaged and the template and film will be damaged.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Impressing demolding device and method based on Van der Waals force
  • Impressing demolding device and method based on Van der Waals force
  • Impressing demolding device and method based on Van der Waals force

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0037] Below in conjunction with specific embodiment, further illustrate the present invention. It should be understood that these examples are only used to illustrate the present invention and are not intended to limit the scope of the present invention. In addition, it should be understood that after reading the teachings of the present invention, those skilled in the art can make various changes or modifications to the present invention, and these equivalent forms also fall within the scope defined by the appended claims of the present application.

[0038] Such as Figure 1-2 As shown, the van der Waals force-based embossing demoulding device of the present invention mainly includes: a vacuum chamber box 1, a vacuum pump 2, a suction pipe 3, a screw motor 4, a guide post 5, a template 6, a film 7, an adsorption unit Body 8, lifting support platform 9, linear pusher (electric push rod) 10, mold lifting knife 11.

[0039]Wherein, the base platform 1-2 is arranged on the bo...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to an imprinting demolding device and method based on Van der Waals force. The device comprises a vacuum cavity box body, a base platform is arranged in the vacuum cavity box body, the base platform is used for placing a template and a film which are to be demolded, and the vacuum cavity box body further comprises a lifting platform and a stripping cutter; an adsorption monomer is arranged on the side, close to the base platform, of the lifting platform, and the adsorption monomer can generate Van der Waals force with the film to be demolded; and the stripping cutter is used for cutting into a bonding interface of the template and the film which are to be demolded, and the cutter surface and the bonding interface are always kept coplanar. According to the imprinting demolding device and method, one-time demolding, in which a complete microstructure is kept, between a template and a film of a large-size wafer can be realized.

Description

technical field [0001] The invention relates to the technical field of ultra-precision manufacturing, in particular to an embossing demoulding device and a demoulding method based on van der Waals force. Background technique [0002] The thin film in this application refers to the general term of the imprint adhesive and the substrate after the imprint adhesive is cured in nanoimprinting. In this application, the bonding interface between the template and the film refers to the bonding interface between the template and the imprinting glue after curing. [0003] The separation between the template and the film is a very important step in nanoimprinting, which is related to the successful transfer of the pattern (microstructure) on the template to the imprinting adhesive. [0004] The methods of demoulding between the template and the film include: manual demoulding method, vacuum adsorption pull-off method, air blowing method, ultrasonic vibration method, and low-pressure m...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B44B5/00B44B5/02
CPCB44B5/00B44B5/0052B44B5/02
Inventor 郭俊任明俊张鑫泉张哲
Owner 霖鼎光学(上海)有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap