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Calibration method of a Mueller matrix detection device

A Muller matrix and detection device technology, which is applied in the field of calibration of the Muller matrix detection device, can solve the problems of not considering the influence of the error of incident light obliquely entering the Muller matrix detection device, and the inability to meet the requirements.

Active Publication Date: 2022-04-15
SOUTH CHINA NORMAL UNIVERSITY
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Problems solved by technology

[0004] However, the existing calibration methods, such as the Chipman analytical calibration method, do not consider the error caused by the incident light obliquely entering the Mueller matrix detection device during the calibration process, so they cannot meet the requirements for anisotropic samples with a certain incident angle. Make accurate measurements and characterization

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  • Calibration method of a Mueller matrix detection device
  • Calibration method of a Mueller matrix detection device
  • Calibration method of a Mueller matrix detection device

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Embodiment Construction

[0046] Based on the fact that the existing Mueller matrix detection device has the wave plate due to improper installation, defects in the processing process or the approximate collimation of the cone beam in the actual optical path, the light is obliquely incident, the applicant uses the existing Mueller matrix detection device The device is transformed into an oblique incidence Mueller matrix detection device, simulating the oblique incidence of incident light to the surface of a quarter-wave plate, and observing the change trend of the Mueller matrix elements of the sample measured under oblique incidence conditions, so as to determine the oblique incidence of light influences.

[0047] see figure 1 , figure 1 It is a structural schematic diagram of an oblique incidence Mueller matrix detection device for simulating oblique incidence of light in the present invention. The oblique incidence Mueller matrix detection device comprises a light source 10, a collimator lens 24, ...

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Abstract

The invention discloses a method for calibrating a Mueller matrix detection device, comprising the following steps: S1 Establishing a phase delay disturbance theory when incident light is obliquely incident on the surface of the first wave plate and the second wave plate of the Mueller matrix detection device respectively Model, to set up the relational model of light intensity value and error term; S2 measures the light intensity value I of standard sample with described Muller matrix detection device; S3 the light intensity value I of described standard sample that step S2 obtains and known The Mueller matrix formula Msam of the standard sample p le is substituted into the equation system; S4 solves all the errors x in the relationship model between the light intensity value and the error term through the numerical calibration method 1 、x 2 、x 3 、x 4 、x 5 、x 6 、x 7 、x 8 and x 9 value; S5 is based on the values ​​of all errors obtained from the solution in step S4, calibrates the original instrument matrix F of the Mueller matrix detection device, and reconstructs the calibration instrument matrix F'. The calibration method of the invention has the characteristics of simple operation, convenience and reliability, high measurement speed and high precision.

Description

technical field [0001] The invention relates to the technical field of polarization imaging, in particular to a calibration method for a Mueller matrix detection device. Background technique [0002] Polarization imaging is a non-labeling, non-destructive, fast detection technology with sub-wavelength resolution. It is compatible with non-polarization optical imaging technology in hardware. It only needs to add a polarizing module and an analyzing module to realize polarization measurement. Moreover, polarization imaging technology can provide richer sample microstructure information than non-polarization imaging, so it is widely used in various fields such as biomedical diagnosis, material characterization, and military target recognition. In polarization optics, the Mueller matrix is ​​often used to describe the transformation process of the interaction between light and matter. The Mueller matrix can completely characterize all the polarization information of the sample, ...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N21/21G06F17/16G06F30/20
CPCG01N21/21G01N21/274G06F17/16G06F30/20
Inventor 唐志列付瑶陈振华
Owner SOUTH CHINA NORMAL UNIVERSITY