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Method for manufacturing display apparatus

A display device and manufacturing method technology, applied in semiconductor/solid-state device manufacturing, electrical components, transistors, etc., can solve the problems of afterimage recognition, increase in the spread of thin film transistors, etc., and achieve the effect of improving reliability

Pending Publication Date: 2021-09-24
SAMSUNG DISPLAY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] However, due to the many protrusions formed in the process of crystallizing amorphous silicon into polysilicon, the spread of thin film transistors increases, and there are problems such as recognition of afterimages

Method used

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  • Method for manufacturing display apparatus
  • Method for manufacturing display apparatus
  • Method for manufacturing display apparatus

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Embodiment Construction

[0035] The present invention can have various modifications and various embodiments, and specific embodiments are illustrated in the drawings and described in detail. Reference and attachment Figure 1 Effects and features of the present invention, and methods for achieving these effects and features will become clear from each embodiment described in detail later. However, the present invention is not limited to the embodiments disclosed below, and can be implemented in various ways.

[0036] In the following examples, terms such as first and second are not limiting terms, but are used to distinguish one component from other components.

[0037] In the following embodiments, a singular expression includes a plurality of expressions when there is no clear contrary meaning in the text.

[0038] In the following embodiments, terms such as "comprising" or "having" should be understood as referring to the existence of the features or constituent elements described in the specifi...

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Abstract

The invention provides a manufacturing method of a display apparatus. The manufacturing method includes preparing a substrate, forming an amorphous silicon layer on the substrate, cleaning the amorphous silicon layer with hydrofluoric acid, crystallizing the amorphous silicon layer into a polycrystalline silicon layer, and forming a metal layer directly on the polycrystalline silicon layer.

Description

technical field [0001] The present invention relates to a method of manufacturing a display device, and more specifically, to a method of manufacturing a display device with improved product reliability. Background technique [0002] Generally, a display device such as an organic light emitting display device includes a thin film transistor for driving each pixel, the thin film transistor including an active layer formed of polysilicon. [0003] In order to form an active layer used in a thin film transistor using a polysilicon thin film, there is a method of depositing amorphous silicon on a substrate and then crystallizing it, or a method of directly depositing polysilicon. [0004] However, due to the many protrusions formed in the process of crystallizing amorphous silicon into polysilicon, the spread of thin film transistors increases, and there is a problem that afterimages are recognized. Contents of the invention [0005] The present invention solves various probl...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/77H01L27/12H01L27/32
CPCH01L27/1244H01L27/1274H10K59/1213H01L21/02532H01L21/02488H01L21/02661H01L21/02675H01L21/02595H01L21/02691H01L27/127H10K71/80H10K59/1201H01L27/1222H01L29/786H10K71/00H01L29/78675H01L29/66757H01L21/02592
Inventor 徐宗吾白炅旼苏炳洙
Owner SAMSUNG DISPLAY CO LTD