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Current source apparatus and method

A technology of current source and DC source, applied in the field of current source, can solve the problems of optical microscope resolution wavelength limitation

Pending Publication Date: 2021-11-26
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The resolving power of an optical microscope is limited by the wavelength of the light used for illumination

Method used

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  • Current source apparatus and method
  • Current source apparatus and method
  • Current source apparatus and method

Examples

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Embodiment Construction

[0016] Reference will now be made in detail to the exemplary embodiments, examples of which are illustrated in the accompanying drawings. The following descriptions all refer to the accompanying drawings, and unless otherwise specified, the same reference numerals in different drawings represent the same or similar elements. The implementations set forth in the following description of the exemplary embodiments do not represent all implementations consistent with the invention. Rather, they are merely examples of systems, apparatus, and methods consistent with aspects of the invention recited in the appended claims. Relative sizes of components in the drawings may be exaggerated for clarity.

[0017] Electronic devices consist of circuits formed on a silicon chip called a substrate. Many circuits can be formed together on the same piece of silicon and are called an integrated circuit or IC. The size of these circuits has been significantly reduced so that more circuits can ...

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Abstract

Disclosed among other aspects is a power supply such as may be used in a charged particle inspection system. The power supply includes a direct current source such as a programmable linear current source connected to a controlled voltage source, where the control signal for the controlled voltage source is derived from a measured voltage drop across the direct current source.

Description

[0001] Cross References to Related Applications [0002] This application claims priority to US Application 62 / 836,282, filed April 19, 2019, which is hereby incorporated by reference in its entirety. technical field [0003] Embodiments provided herein relate to a current source, such as one that can be used to supply current to a load, such as a lens, in a charged particle manipulator with one or more charged particle beams (e.g., using one or more electron beam electron microscopy setup). Background technique [0004] Integrated circuits are made by creating patterns on wafers (also known as substrates). The wafer is supported on a wafer stage in the apparatus for creating the pattern. Part of the process for manufacturing integrated circuits involves looking at or "inspecting" various parts of the wafer. This can be done using a charged particle manipulator such as a scanning electron microscope or SEM. [0005] Optical microscopy uses visible light and transparent ...

Claims

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Application Information

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IPC IPC(8): H01J37/141H01J37/24
CPCH01J37/24H01J37/141H01J37/241H01J2237/141
Inventor 王義向王燕秋何晓东叶国凡
Owner ASML NETHERLANDS BV