Laser filling method and device for multilayer contour pattern based on contour lines

A contour and pattern technology, applied in the field of data processing, can solve the problems of wasting laser energy resources, low accuracy, and low efficiency, and achieve the effects of reducing search volume, accurate filling, and reducing time costs

Active Publication Date: 2021-12-14
NAT UNIV OF DEFENSE TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] However, when the current laser filling technology is combined with computer technology for pattern filling, there are problems such as low efficiency, low accuracy, and waste of laser energy resources.

Method used

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  • Laser filling method and device for multilayer contour pattern based on contour lines
  • Laser filling method and device for multilayer contour pattern based on contour lines
  • Laser filling method and device for multilayer contour pattern based on contour lines

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Embodiment Construction

[0059] In order to make the purpose, technical solution and advantages of the present application clearer, the present application will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present application, and are not intended to limit the present application.

[0060] In one embodiment, such as figure 1 As shown, a method for laser filling of contour-based multi-layer contour patterns is provided, comprising the following steps:

[0061] Step 102, obtain the coordinate point data set for contour filling, and obtain a multi-layer scatter diagram in a preset coordinate system according to the coordinate point data set; connect the scattered points one by one according to the scatter diagram to obtain a pattern to be filled.

[0062] Mark the coordinate point data set in the preset coordinate system. The coordinate point data set w...

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Abstract

The invention relates to a laser filling method and device for a multilayer contour pattern based on contour lines, computer equipment and a storage medium. The method comprises the following steps: performing outer contour inner offset operation on a to-be-filled pattern according to an equidistant offset algorithm to obtain a contour offset pattern; performing grid method environment modeling on the contour offset pattern to obtain a preprocessed grid pattern; performing inner and outer contour discrimination on the grid pattern to obtain a to-be-filled grid; for the to-be-filled grid, constructing a shortest path problem set; and solving the shortest path problem set by using an A* algorithm to obtain an optimal filling path of the to-be-filled grid. By adopting the method, the laser filling efficiency of the pattern can be improved.

Description

technical field [0001] The present application relates to the field of data processing, in particular to a method, device, computer equipment and storage medium for laser filling of contour-based multi-layer contour patterns. Background technique [0002] In recent years, with the improvement of laser performance and reliability, coupled with the rapid development of computer technology and the advancement of optical devices, laser marking technology has developed very rapidly. With the development of computer and electronic technology, at present, laser marking technology and The combination of computer technology can modify the content of the label in the computer, and then it is widely used in the field of pattern filling. [0003] However, when the current laser filling technology is combined with computer technology for pattern filling, there are problems such as low efficiency, low accuracy, and waste of laser energy resources. Contents of the invention [0004] Bas...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G06T7/12G06T7/13G06T7/73G06T11/40G06T17/20
CPCG06T7/12G06T7/13G06T7/73G06T11/40G06T17/205Y02P90/30
Inventor 周鋆王敏杨昊张伟康
Owner NAT UNIV OF DEFENSE TECH
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