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Ultraviolet curing system and control method thereof

A technology of ultraviolet and control device, applied in the field of ultraviolet curing system and its control, can solve the problems of poor wafer processing quality, and achieve the effect of improving the processing quality

Pending Publication Date: 2022-03-08
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] The purpose of the embodiment of the present application is to provide an ultraviolet curing system and its control method, which can solve the problem of poor wafer processing quality

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  • Ultraviolet curing system and control method thereof
  • Ultraviolet curing system and control method thereof
  • Ultraviolet curing system and control method thereof

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Embodiment Construction

[0021] The technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Apparently, the described embodiments are part of the embodiments of the present application, not all of them. Based on the embodiments in this application, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of this application.

[0022] The terms "first", "second" and the like in the specification and claims of the present application are used to distinguish similar objects, and are not used to describe a specific sequence or sequence. It is to be understood that the data so used are interchangeable under appropriate circumstances such that the embodiments of the application can be practiced in sequences other than those illustrated or described herein. In addition, "and / or" in the specification and...

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Abstract

The invention discloses an ultraviolet curing system and a control method thereof. The ultraviolet curing system comprises a driving mechanism, a first light source, a second light source, a position detection assembly and a control device. Wherein the driving mechanism is used for driving the first light source and the second light source to rotate in at least one single rotation period; the position detection assembly is used for acquiring at least two groups of detection signals corresponding to different positions in a single rotation period of the first light source and the second light source, and transmitting the detection signals to the control device; the control device is used for acquiring actual rotation parameters of the first light source and the second light source driven by the driving mechanism to rotate to corresponding positions in a single rotation period according to the detection signals, and correcting the theoretical rotation parameters and the actual rotation parameters when the theoretical rotation parameters and the actual rotation parameters meet correction conditions. And correcting the theoretical rotation parameter of the driving mechanism in the next single rotation period according to the actual rotation parameter. According to the scheme, the problem that the wafer processing quality is poor can be solved.

Description

technical field [0001] The application belongs to the technical field of semiconductor processing, and in particular relates to an ultraviolet curing system and a control method thereof. Background technique [0002] In the field of semiconductors, the UV curing process is a relatively common processing technology, and the light source is an indispensable device for the UV curing process. Therefore, the structure of the light source has a crucial impact on the effect of the UV curing process. [0003] Due to the limitations of production capacity and process requirements, the light source used in the UV curing process is usually a long strip light source, while the wafer to be cured has a circular structure. In order to meet the uniformity requirements, it is necessary to drive the light source to rotate through the driving mechanism so that The light from the light source is evenly swept across the wafer. [0004] However, the long-term operation of the UV curing system wi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/67
CPCH01L21/67115
Inventor 顾文亮
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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