Single line diagram layout machine learning processing method and system

A machine learning and processing method technology, applied in the field of machine learning, can solve the problems of low efficiency of drawing, high risk of errors, inability to inherit and learn from experience, etc., so as to reduce the risk of drawing errors and improve the efficiency of drawing.

Pending Publication Date: 2022-04-12
GUIZHOU POWER GRID CO LTD
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  • Abstract
  • Description
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  • Application Information

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Problems solved by technology

[0003] However, drawing specifications are aimed at individual drafters and one-line diagrams, and the experience of standardized one-line diagrams cannot be inherited and used for reference, resulting in low drawing efficiency and higher risk of errors

Method used

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  • Single line diagram layout machine learning processing method and system
  • Single line diagram layout machine learning processing method and system
  • Single line diagram layout machine learning processing method and system

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Embodiment Construction

[0034] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. It should be understood that the preferred embodiments are only for illustrating the present invention, but not for limiting the protection scope of the present invention.

[0035] From the perspective of machine learning, this patent uses typical one-line diagrams as a blueprint. Through machine learning, it can identify other new additions and adjust the quality of one-line diagrams. Through experience learning, a virtuous circle is formed to guide the formation of one-line diagrams.

[0036] Such as figure 1 As shown, the one-line diagram layout machine learning processing method of the present invention includes:

[0037] Step S1: Collect and integrate data: call the data collection component and export the full one-line diagram SVG file as the original data for machine learning;

[0038] Step S2: Data preprocessing: call the data pr...

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Abstract

The invention discloses a single line diagram layout machine learning processing method and system, and the method comprises the steps: taking a typical single line diagram as a blueprint from the angle of machine learning, forming a virtuous circle through machine learning, discrimination of other newly added drawings, adjustment of the drawing quality of the single line diagram, and through an experience learning mode, guiding the drawing of the single line diagram, thereby improving the drawing efficiency, and improving the production efficiency. And the risk of drawing errors is also reduced.

Description

technical field [0001] The invention relates to the technical field of machine learning, in particular to a one-line diagram layout machine learning processing method and system. Background technique [0002] The one-line diagram is one of the important tools for the operation and maintenance of distribution network equipment. The difficulty and workload of manual drawing and drawing software are relatively large. In the case of increasing complexity of the power grid structure, it is difficult to meet the intelligent In order to meet the requirements of the development and use of the power grid, the power grid companies in various places, on the basis of the unified grid GIS platform, have compiled the detailed rules for the production and dispatching application of single-line diagrams of distribution lines applicable to their own units, and carried out the detailed rules for the drawing of single-line diagrams. Refine the specifications to guide the drawing of the one-lin...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G06F30/18G06K9/62G06Q50/06
Inventor 纪元袁捷朱州钱俊凤黄莉雅郭仁超张克贤
Owner GUIZHOU POWER GRID CO LTD
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