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Method for generating OPC test pattern

A technology for testing graphics and layouts, which is applied to the photolithographic process of patterned surfaces, originals for photomechanical processing, and microlithography exposure equipment, etc., which can solve problems such as errors and cumbersome processes

Pending Publication Date: 2022-06-21
SHANGHAI HUALI INTEGRATED CIRCUTE MFG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The process of the existing method for generating OPC test patterns is very cumbersome, and there are certain requirements for the order of parameter filling, which is easy to make mistakes in the process of constructing the function

Method used

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  • Method for generating OPC test pattern
  • Method for generating OPC test pattern
  • Method for generating OPC test pattern

Examples

Experimental program
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Embodiment Construction

[0028] like figure 2 As shown, it is a flowchart of a method for generating an OPC test pattern according to an embodiment of the present invention; the method for generating an OPC test pattern according to an embodiment of the present invention includes the following steps:

[0029] Step 1, establishing a basic repeatable unit library, wherein the basic repeatable unit library includes a plurality of required minimum repeating unit layouts.

[0030] In the embodiment of the present invention, the layout of the minimum repeating unit is drawn by using EDA software.

[0031] The layout of each minimum repeating unit is set in GDS format, and the basic repeatable unit library is a GDS file.

[0032] The grid precision is set while saving the minimum repeating unit layout in GDS format.

[0033] In some embodiments, the base repeatable cell library only needs to be built the first time an OPC test pattern is generated.

[0034] When the OPC test pattern is generated for the ...

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PUM

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Abstract

The invention discloses a method for generating an OPC (optical proximity correction) test pattern, which comprises the following steps of: 1, establishing a basic repeatable unit library which comprises a plurality of required minimum repetitive unit layouts; step 2, inputting the path of the minimum repetitive unit layout, the name of the minimum repetitive unit layout, the array block spacing of the OPC test pattern and the repetitive period of the OPC test pattern into the script; and step 3, running the script to generate an OPC test pattern array. The method can simplify the process of generating the complex test pattern, can reduce the workload of drawing the test pattern, and can improve the working efficiency.

Description

technical field [0001] The invention relates to a method for manufacturing a semiconductor integrated circuit, in particular to a method for generating an Optical Proximity Correction (OPC) test pattern. Background technique [0002] Model-Based Optical Proximity Correction (MBOPC) has been widely used since the 90nm technology node and has become an essential step in layout correction. The design of the test pattern is the first step in modeling. Currently, we use the TpGen tool to draw test graphics, which is a script written in the tcl language. This tool cannot directly call functions to generate some complex graphics, and engineers need to write their own code to realize graphics construction. like figure 1 Shown is a flow chart of an existing method for generating an OPC test pattern; the existing method for generating an OPC test pattern includes the steps: [0003] As shown in the step marked 101, in the process of constructing the graph, firstly, the parameter an...

Claims

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Application Information

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IPC IPC(8): G03F1/36G03F7/20
CPCG03F1/36G03F7/70441
Inventor 李青康萌于世瑞
Owner SHANGHAI HUALI INTEGRATED CIRCUTE MFG CO LTD