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Polishing production system

A technology of production system and reaction tank, which is applied in the field of polishing, can solve the problems of easy failure of polishing liquid, time-consuming and labor-intensive, and increased processing costs, so as to avoid the deterioration of workpiece polishing effect, shorten the interval time, and improve work efficiency.

Pending Publication Date: 2022-07-12
李洋
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The consumption of polishing liquid in the existing chemical polishing is very fast, and the polishing liquid is prone to failure. It is necessary to manually pay attention to the state of the polishing liquid and replenish it in time, which is time-consuming and laborious, and increases the processing cost.

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Embodiment Construction

[0027] The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0028] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "top", "bottom", "front", " Rear", "Left", "Right", "Straight", "Horizontal", "Top", "Bottom", "Inner", "Outer", "Clockwise", "Counterclockwise" etc. The positional relationship is based on the orientation or positional relationship shown in the accompanying drawings, which is...

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Abstract

The invention relates to the technical field of polishing, in particular to a polishing production system which comprises a reaction tank, four fixing columns are fixedly mounted on the lower surface of the reaction tank, a cover plate is placed on the upper surface of the reaction tank, a plurality of clamps are fixedly mounted on the lower surface of the cover plate, and a liquid discharge pipe is fixedly connected to one side of the reaction tank. A liquid adding mechanism is fixedly mounted on the outer side wall of the reaction tank; and the liquid adding mechanism is used for adding chemical polishing liquid into the reaction tank in time. The liquid adding mechanism is arranged to automatically add liquid into the reaction tank, the situation that a worker needs to pay attention to the use amount of the polishing liquid in the reaction tank all the time is avoided, operation is easy in the liquid adding process, the interval time between liquid shortage and liquid adding during reaction is shortened, and therefore the situation that the polishing effect of a workpiece becomes poor due to lack of the polishing liquid is avoided; therefore, the working efficiency of the reaction tank is improved, and the use effect is better.

Description

technical field [0001] The invention relates to the technical field of polishing, in particular to a polishing production system. Background technique [0002] Polishing refers to the use of mechanical, chemical or electrochemical action to reduce the surface roughness of the workpiece to obtain a bright and smooth surface. [0003] Polishing cannot improve the dimensional accuracy or geometric accuracy of the workpiece, but aims to obtain a smooth surface or specular gloss, and sometimes it is also used to eliminate gloss (matting), usually a polishing wheel is used as a polishing tool. [0004] Chemical polishing is a method of eliminating wear scars, etching and leveling by selectively dissolving the uneven area of ​​the sample surface by chemical reagents. [0005] Chemical polishing operation steps: After the sample is polished and cleaned, the chemical polishing solution is prepared. The sample is immersed in the polishing solution with a fixture, stirred and observed...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23F3/00B01J19/18B01J4/00B01J19/00B01F27/90B01F27/191
CPCC23F3/00B01J19/18B01J4/001B01J19/0053
Inventor 李洋徐磊成
Owner 李洋