Unlock instant, AI-driven research and patent intelligence for your innovation.

Apparatus and method for imaging and interferometry

A technology of interferometry and measurement equipment, applied in the field of equipment and methods for imaging and interferometry, capable of solving problems such as reducing the quality of acquired images

Pending Publication Date: 2022-07-12
FOGALE NANOTECH SA
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In this case, however, light still returns from the interferometer's reference arm to the camera, which degrades the quality of the acquired image

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Apparatus and method for imaging and interferometry
  • Apparatus and method for imaging and interferometry
  • Apparatus and method for imaging and interferometry

Examples

Experimental program
Comparison scheme
Effect test

no. 1 example

[0177] According to a first embodiment, a contour measurement method can be used to perform step 17a. Profilometry is based on the processing of a sequence of interferograms.

[0178] In this type of method, the measurement and reference beams are preferably adjusted to impinge on the detector with substantially parallel or merged or slightly inclined propagation directions to produce a flat tint or slightly modulated interferogram.

[0179] A first example of this profilometry method implements an algorithm based on phase stepping interferometry (PSI, "phasestepping interferometry" in English).

[0180] For this purpose, multiple interferograms (constituting interference signals) are acquired for multiple optical paths or phase difference values ​​between the measurement beam and the reference beam, within the limits of the coherence length of the light source.

[0181] The resulting interferometric signal is then determined at Phase and optional amplitude at any point in f...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a device (1000, 2000, 3000, 4000, 5000, 6000) for measuring a surface of an object (100), comprising:-at least one light source (112, 212, 320, 520); -at least one optical sensor (102, 202, 624); and-an interferometric measurement device having a measurement arm and a reference arm, the measurement arm being configured to direct light from the at least one light source (112, 212, 320, 520) through the optical focusing system (107, 207) towards a surface of the object to be measured and to direct light from the surface to be measured towards the at least one optical sensor (102, 202, 624); according to a first configuration, referred to as an interferometric configuration, the measuring device is configured to illuminate the reference arm and the measuring arm with at least one light source (112, 212, 320, 520) and to direct light from the measuring arm and the reference arm towards at least one optical sensor (102, 202, 624) in order to form an interference signal; according to a second configuration, referred to as an imaging configuration, the measuring device is configured to illuminate at least the measuring arm and to direct only light from the measuring arm towards the at least one optical sensor (102, 202, 624) in order to form an image of the surface to be measured; the measuring device further comprises a digital processing unit configured to generate information about the surface to be measured as a function of the interference signal and the image. The invention also relates to a method (10) for measuring a surface of an object (100).

Description

technical field [0001] The invention relates to a device for combined full-field imaging and interferometric measurement of an object. The invention also relates to a method for combining imaging and interferometry. [0002] The field of the invention is, but is not limited to, full field interferometric optical systems for measuring shapes and surfaces of objects. Background technique [0003] Different types of full-field interferometric sensors are known for measuring the shape of surfaces or layers of objects. [0004] This type of sensor implements an optical measurement beam interacting with the object as well as a reference beam, which is recombined onto a sensor such as a camera to generate an interference signal. When objects are imaged on the camera according to the field of view, they are called "full field". Processing the interference signal makes it possible to reconstruct the phase profile or shape of the object from the field of view. Under these conditio...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G01B9/02G01B9/02015G01B9/0209G01B11/24G01H9/00G03H1/04G03H1/08
CPCG01B9/0203G01B2290/70G01B9/02032G01B9/0209G01B11/2441G01B9/02007G01H9/00G03H1/0443G03H2001/0033G03H1/0866G01B11/30G03H1/0005G03H2001/0445G03H2001/0452G03H2222/45
Inventor 阿兰·库特维尔吉莱斯·弗莱斯阔特
Owner FOGALE NANOTECH SA