Six-degree-of-freedom precision micro-motion platform

Abstract

The invention provides a six-degree-of-freedom precise micro-motion platform which comprises a fixed bottom plate, a carrying disc and a position and posture adjusting structure, and the position and posture adjusting structure is located between the fixed bottom plate and the carrying disc and used for adjusting displacement of a workpiece in the X-axis direction, and / or the Y-axis direction and / or the Z-axis direction and / or adjusting the angle of the workpiece. The pose adjusting structure comprises multiple layers of connecting carrier plates, and pose adjusting assemblies are arranged between the fixed bottom plate and the connecting carrier plate adjacent to the fixed bottom plate, between the connecting carrier plate and the carrying disc adjacent to the connecting carrier plate and between the adjacent connecting carrier plates. The micro-motion platform has the advantages of being simple in structure, low in cost and free of abrasion and dust, displacement of the workpiece on the carrying disc in the X-axis direction, the Y-axis direction and the Z-axis direction and six-degree-of-freedom adjustment of the angle of the workpiece can be split through the multiple pose adjusting assemblies, and therefore the pose of the workpiece can be adjusted and accurately controlled.

Description

technical field [0001] The invention belongs to the technical field of micro-nano processing, and relates to a six-degree-of-freedom precision micro-movement platform. Background technique [0002] Micro-nano processing technology is to process, assemble and integrate the target and its target components in the range of millimeters to nanometers, involving a wide range of fields and interdisciplinary. The accuracy requirements of position and spatial attitude are getting higher and higher. The traditional position adjustment platform cannot accurately adjust the position and attitude of the workpiece due to defects such as total weight, high space ratio, low precision, regular maintenance, and easy emission of dust from lubricating oil. , it is no longer suitable for the field of micro-nano processing. [0003] The existing six-degree-of-freedom or three-degree-of-freedom position adjustment platform (also called pose adjustment device, motion mechanism, etc.) has the advan...

AI Technical Summary

Problems solved by technology

[0004] In order to solve the problem that the position adjustment platform of the existing millimeter-to-nano-scale products is in the process of adjusting the position and posture of the workpiece, dust, movement gaps, and movement hysteresis caused by wear and tear in the guide mechanism are prone to appear. Product performance, reducing the accuracy of the workpiece position and posture, the invention discloses a six-degree-of-freedom precision micro-motion platform with simple structure, low cost, and no wear and dust, which is widely used in micro-nano processing (such as laser direct writing , nanoimprinting, etc.), optical alignment, biomedical and other fields in the application of micro-nano processing, optical detection alignment and other environments

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