Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Impression mother plate with line pattern, method for forming same

A master and texture technology, which is applied in the field of embossed masters with texture patterns, can solve the problems of inability to copy patterns, etc.

Inactive Publication Date: 2006-06-14
IWIN TECH CO LTD
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

As the depth of the texture increases to several microns or even tens of microns, the above-mentioned master plate manufacturing technology cannot completely replicate the pattern with segment deep lines on the master plate

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Impression mother plate with line pattern, method for forming same
  • Impression mother plate with line pattern, method for forming same
  • Impression mother plate with line pattern, method for forming same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0029] For other purposes and effects of the present invention, please refer to the embodiments shown in the accompanying drawings, which are described in detail as follows.

[0030] Please refer to Fig. 2 (A) shown, the manufacture method of master plate unit of the present invention is to utilize photosensitive type UV adhesive 31 to be coated on the master mold 20 surface of tool texture 21, and cover transparent plate 32 on UV adhesive 31, as It is made of PC or PVC material; make the UV glue 31 penetrate into the texture 21 completely to form the corresponding texture 311; irradiate UV light to make the UV glue 31 mature and harden, so that the UV glue 31 will be attached to the transparent plate 32; then make the UV glue 31 Separated from the master mold 20 , the texture 21 of the master mold 20 is completely copied on the UV glue 31 . Repeat this step several times to obtain several pieces of master units 30 with deep lines 311 .

[0031] As shown in the aforementioned...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

An embossed master plate with texture pattern and its plate assembly method, at least two master plate units with metal film on the back are attached to the surface of the silica gel substrate in a downward manner with lines; at the joints of these master plate units Apply UV glue on the top, the UV glue fills the gap of the seam, and partly penetrates to the surface of the texture; irradiates UV light, makes the UV glue on the master unit and in the seam harden, and makes each The chip master unit is combined into a large master; the master is separated from the silicone substrate; and the immature and hardened UV glue that seeps into the surface of the texture is cleaned. This invention proposes an innovative plate-making technology that is simple and takes into account the texture and seam flatness requirements of subsequent electroforming and embossing processes, so that when many master plate units are assembled into a large master plate, the seam has better flatness degree without affecting the grain structure on both sides of the seam.

Description

technical field [0001] The present invention relates to embossing masters, especially embossing masters with textured patterns. The invention also relates to a method for making the master and a method for grouping. Background technique [0002] Currently used in the manufacture of holographic pattern imprinting masters in the holographic texture pattern imprinting process, for example, Taiwan Patent Publication No. 384419 discloses a method of making a photomask using a computer-drawn grating pattern, and then using a semiconductor process to make a full-body pattern. The photo master is then electroformed into a nickel plate; the nickel plate is then used to replicate the finished plastic hologram. The above-mentioned technique of making a master using a semiconductor takes a lot of time and costs a lot. [0003] see figure 1 As shown, there is another cheaper and simpler method for making a master plate, which is to make a plastic sheet 10 and a master mold 20 engraved...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G11B7/26
Inventor 王星贸徐敏益
Owner IWIN TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com