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Smooth multipart substrate support member for CVD

A technology for equipment and substrates, applied in coating, gaseous chemical plating, metal material coating processes, etc., can solve the problems of heat treatment chamber pollution sources, spacer support surface degradation, and spacer life reduction.

Inactive Publication Date: 2006-09-20
APPLIED MATERIALS INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When these bond sites later break, residues from earlier reactions remain on the spacer, potentially damaging the substrate being processed
Furthermore, the residues will cause damage to the substrate being processed or may be a source of contamination in the thermal processing chamber
Also, earlier residues may cause additional chemical reactions between the spacer and glass or further degrade the spacer support surfaces or reduce the life of the spacer

Method used

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  • Smooth multipart substrate support member for CVD
  • Smooth multipart substrate support member for CVD
  • Smooth multipart substrate support member for CVD

Examples

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Embodiment Construction

[0018] The present invention relates to a support member for a glass substrate, advantageously for reducing glass substrate damage caused by friction, chemical reaction or contamination of friction and chemical reaction.

[0019] figure 1 An embodiment of a support member of the present invention disposed within a schematically heated chamber 10 is shown. A conventional heating chamber 10 includes side walls 12 , 14 , a bottom wall 16 and a lid 18 . Additional side walls 13, 15 ( figure 1 Not shown in ) perpendicular to the side walls 12, 14, thereby constituting the structure of the heating chamber 10. The side wall 13 adjacent to the processing system (not shown) cooperates with a slotted valve (not shown) through which the glass sheet can be transferred into and removed from the heating chamber 10 from the processing system.

[0020] The side walls 12 and 14 cooperate with suitable heating coils 20 for controlling the temperature of the heating chamber 10 . The heatin...

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Abstract

An apparatus for supporting a glass substrate is provided. In one embodiment, a substrate support (50) is provided having a base structural member (52) and an upper top portion (54) having a surface thereon adapted to minimize friction and / or chemical reactions between the substrate support and a glass substrate supported thereon. The substrate supports may be utilized in various chambers such as load locks chamber and chambers having thermal processes.

Description

technical field [0001] The invention relates to support members for large area glass substrates. In particular, the invention relates to support members for supporting large area glass substrates during high temperature processing. Background technique [0002] Thin film transistors have heretofore been fabricated on large glass substrates or plates for use in monitors, flat panel displays, solar cells, personal digital assistants (PDAs), mobile phones, and the like. Transistors are formed by sequentially depositing various films including amorphous silicon, doped and non-doped silicon oxide, silicon nitride, etc. in a vacuum chamber. Thin films for transistors can be deposited, for example, by chemical vapor deposition (CVD). After deposition, many films used in transistor fabrication are heat treated. [0003] CVD is a high-temperature process, which requires the substrate to withstand a temperature in the order of 300°C-400°C. Higher temperatur...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/00C23C16/458C03C17/00H01L21/205H01L21/683H01L21/687
CPCH01L21/6875C03C17/002C23C16/4581C23C16/4583H01L21/68778
Inventor W·A·巴格利E·M·拉米雷S·C·沃尔加斯特
Owner APPLIED MATERIALS INC