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Correlation of end-of-line data mining with process tool data mining

一种处理工具、处理流程的技术,应用在数据处理应用、电数字数据处理、特殊数据处理应用等方向

Inactive Publication Date: 2007-07-04
APPLIED MATERIALS INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

As a result, users often spend more time trying to figure out the problem, rather than working on actually repairing and adjusting treatment tools after they have been identified

Method used

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  • Correlation of end-of-line data mining with process tool data mining
  • Correlation of end-of-line data mining with process tool data mining

Examples

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Embodiment Construction

[0009] Figure 1 illustrates a processing tool optimization system 1000 constructed in accordance with one embodiment of the present invention. It is well known that after devices (here also referred to as integrated circuits or ICs) have been fabricated on semiconductor wafers or substrates, a number of functional tests, such as but not limited to electronic tests, are performed to determine whether the devices function as described above. The design specifications are consistent. As shown in Figure 1, the results of these functional tests (i.e., the collection of functional test results output from the functional test instrument) are stored at the plant-wide according to any of a number of methods known to those skilled in the art (fab-wide) production line back-end yield improvement database 140 . Predetermined functional test kits and functional test devices to perform these functional tests are also well known to those skilled in the art. It should be noted that embodime...

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Abstract

One embodiment of the present invention is a process tool optimization system that includes: (a) a data mining engine that analyzes end-of-line yield data to identify one or more process tools associated with low yield; and (b) in response to output from the analysis, analyzes process tool data from the one or more process tools to identify one or more process tool parameters associated with the low yield.

Description

technical field [0001] One or more embodiments of the invention relate to the correlation of end-of-line data mining with process tool data mining. Background technique [0002] The manufacture of semiconductor devices continues to become more complex as market demands drive increasing circuit densities. For example, a typical manufacturing process starts with a single piece of silicon (referred to herein as a wafer or substrate) and processes it through a series of about 300 to 500 individual manufacturing steps to Many individual devices are fabricated on each wafer. Additionally, as circuit densities increase, line widths will decrease, and newer technologies and materials will be used in semiconductor manufacturing. For example, copper processing technology is moving from 0.18μm technology to 0.13μm technology. In addition, the advent of copper seeds and plating, along with the added difficulty in applying new low-k material films and the requirement to fill 0.13μm st...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G06F19/00H01L21/66H01L21/00
CPCY10S707/99932H01L22/20H01L22/00H01L21/00
Inventor I·拜恩格拉思A·费里A·多尔
Owner APPLIED MATERIALS INC
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