Container internal surface chemical vapor depositon coating method

Abstract

A chemical gas-phase deposition method for preparing a coated layer on the inner surface of container includes such steps as connecting a gas inlet tube to the opening of said container, inserting a guide tube for exhausting tail gas, connecting the external end of said guide tube to vacuumizing pump, and vacuum chemical gas-phase depositing to generate a coated layer. Its advantages are high uniformity and short period.

Description

Technical field: [0001] The invention relates to a chemical vapor deposition coating method on the inner surface of a container. Background technique: [0002] Chemical vapor deposition is an advanced film preparation technology that can prepare structural or functional films including ceramics and refractory metals. It is widely used in metallurgy, machinery, aerospace, nuclear, energy and other fields. Chemical vapor deposition is formed by the chemical reaction of the gas phase precursor of the deposit. Because there is a continuous supply of the gas phase, a straight cylinder reactor is generally selected. The deposition workpiece needs to be placed at a high temperature in the reactor, and the reaction gas enters from the reactor corresponding to one end of the workpiece. The gas port enters, and reacts in the high-temperature zone to form solid-phase products and gas-phase tail gas. The solid-phase products are deposited on the surface of the workpiece, and the gas-pha...

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Problems solved by technology

Due to the small caliber of the reserved thin tube, although the pulse chemical vapor deposition method can be used to deposit the tritium-resistant c

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