Method for preparing composite membrane of high polymer Nano materal

A nano-material and composite film technology, which is applied in the production of silver halide photosensitive materials, can solve the problem of affecting the photosensitive performance of silver halide photosensitive materials, reducing the permeability of the protective film to the developing solution, and the formula of the protective film cannot fundamentally improve the silver halide photosensitive material. Physical properties and other issues, to achieve good anti-adhesion and anti-smudge performance, improved scratch resistance, high electrical conductivity
CN1539868AInactive Publication Date: 2004-10-27NANYANG NORMAL UNIV
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
NANYANG NORMAL UNIV
Publication Date
2004-10-27
Estimated Expiration
Not applicable · inactive patent
Patent Text Reader

Abstract

A composite film used as the protecting film of photosensitive silver halide material is prepared from high-molecular material and nanoparticles chosen from silicon oxide, aluminium oxide and zinc oxide. Its advantage are high water and light penetrability, low surface viscosity, good antistatic action, and high strength.
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Description

Technical field:

[0001] The invention belongs to the production field of silver halide photosensitive materials, and relates to a method for preparing a composite film used for protection in the production of silver halide photosensitive materials. Background technique:

[0002] In the production of silver halide photosensitive materials (including: printing film, X-ray film, film, photographic paper, etc.), the uppermost layer of the film is generally coated with a protective protective film. The main function of the protective film is to prevent The photosensitive emulsion in the lower layer rubs against other substances during use to cause fog. At the same time, the protective film also prevents the adhesion between the films and prevents the films from generating static electricity during use. Because gelatin has better permeability after film formation, gelatin is used as the main film-former in protective films, and some other polymer compounds and microspheres of inor...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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