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Method of mass flow control flow verification and calibration

A technology of mass flow controllers and flow controllers, applied in chemical instruments and methods, testing/calibration devices, measuring devices, etc., can solve the problem that it is impossible to accurately know the volume of the processing chamber, and it is impossible to keep the temperature of the processing chamber constant or determined Processing room temperature and other issues

Inactive Publication Date: 2005-02-02
AGERE SYST INC
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

For example, it is not possible to know the chamber volume precisely due to inhomogeneities within the chamber walls
At the same time, it is not possible to keep the chamber temperature constant or to determine the chamber temperature

Method used

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  • Method of mass flow control flow verification and calibration
  • Method of mass flow control flow verification and calibration

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Embodiment Construction

[0023] Before describing in detail specific semiconductor integrated circuit process methods and apparatus according to the present invention, it should be noted that the present invention is a novel and non-obvious combination of hardware elements and process steps. Accordingly, in the drawings and specification, these elements are represented by conventional elements, where elements and process steps conventionally known in the art are not described in great detail, but are described in greater detail for elements and step.

[0024] As shown in FIG. 2 , a process tool configuration for flow calibration or verification includes valves 60 , 62 , 64 within exhaust line 46 to form bypass loop 68 in accordance with the present invention. Valve 60 is located in the fluid inlet passage of bypass loop 68 and valve 62 is located in the fluid outlet passage of bypass loop 68 . In a preferred embodiment, each valve 60, 62 and 64 comprises a manually operated valve. In another embodim...

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Abstract

A method and apparatus for monitoring or calibrating a gas flow rate through a mass flow controller, for example, in a semiconductor fabrication process. A reference mass flow controller is disposed in a vent bypass loop for receiving gas flow from one of a plurality of mass flow controllers associated with a like plurality of supply gases. One of the gas supply mass flow controllers is selected and commanded to a specific gas flow rate. The gas flow through the selected mass flow controller also passes through the reference mass flow controller as the gas flows to a vent. Comparing the gas supply mass flow controller commanded flow rate with the actual flow rate as determined by the reference mass flow controller provides monitoring and calibration of the gas supply mass flow controller.

Description

[0001] This application claims priority under 35 U.S.C. 119(e) to Provisional Patent Application filed May 12, 2003 and assigns application number 60 / 469,669. technical field [0002] The present invention relates generally to the fabrication of semiconductor integrated circuits, and more particularly to methods and apparatus for the verification and calibration of mass flow controllers through which gases are supplied to processes used during the fabrication of integrated circuits Room (process chamber). Background technique [0003] An integrated circuit (or chip) includes a silicon substrate with semiconductor devices, such as transistors, formed with doped regions within the substrate. Conductive interconnect structures formed in multiple parallel layers overlying the semiconductor substrate electrically connect the semiconductor devices to form electronic circuits within the integrated circuit. [0004] Fabrication of integrated circuits begins with a silicon wafer tha...

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Application Information

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IPC IPC(8): B01J4/02G01F25/00G01N29/02H01L21/00H01L21/02H01L21/205H01L21/3065H01L21/66
CPCG01F25/0038G01F25/17
Inventor 威廉·丹尼尔·贝弗斯约瑟夫·威廉·巴克夫勒詹姆斯·L·弗莱克罗伯特·弗兰西斯·琼斯贝内特·J·罗斯
Owner AGERE SYST INC