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Method for producing a master disk,stamper and recording medium,and master disk, stamper and recording medium

A technology for recording media and master discs, applied in the field of master discs, can solve the problems of expensive, large equipment, insufficient temperature increase, etc., and achieve the effects of cheap manufacturing, easy manufacturing and improved resistance

Inactive Publication Date: 2005-03-09
PANASONIC CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This electron beam drawing must perform a drawing operation in a high vacuum, and therefore has a problem in that the equipment is large and expensive
However, due to an insufficient increase in temperature, the sites with smaller irradiance at both sides of the spot do not achieve a change of state

Method used

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  • Method for producing a master disk,stamper and recording medium,and master disk, stamper and recording medium
  • Method for producing a master disk,stamper and recording medium,and master disk, stamper and recording medium
  • Method for producing a master disk,stamper and recording medium,and master disk, stamper and recording medium

Examples

Experimental program
Comparison scheme
Effect test

no. 1 example

[0046] In the first embodiment, a low-oxidation film is formed as a heat-sensitive material layer 102 on a substrate 101 such as a ground glass substrate. After the DC magnetron sputtering equipment is equipped with an antimony target, and after the glass substrate 101 is fixed on the substrate holder, a cryopump is used to vacuum the inside of the chamber until 1×10 -4 High vacuum of Pa. While the vacuum is being exhausted, argon is introduced into the chamber until 0.10 Pa, and then, oxygen is introduced until the total pressure of 0.11 Pa. After that, while rotating the substrate 101, a direct current was applied to the antimony target to form a film, so that the film thickness of the antimony oxide became 80 nm.

[0047] In this embodiment, by introducing oxygen during the film formation, a low-oxidation antimony film can be formed on the substrate 101. However, a material having a composition of a low-oxidation antimony film can be used as a target material to perform sputter...

Embodiment 2

[0058] In Example 2, film formation, recording, and development were performed in the same manner as in Example 1. In this embodiment, when the antimony film is formed as a thermosensitive material under an oxygen atmosphere, at the same time, a tellurium target used as an additive is discharged to form a low-oxidation antimony film and a tellurium film. The tellurium content is adjusted by changing the tellurium input power during sputtering.

[0059] Adding tellurium to the thermosensitive material layer 102 containing antimony as a main component can reduce the surface roughness of the unexposed portion 104 during development. The surface roughness of the unexposed portion 104 is considered to be attributable to the low resistance of the portion that cannot maintain a stable amorphous state to the developer. In Example 2, it is conceivable that its solubility is less than that of Sb by adding 2 O 3 The solubility of tellurium can separate tellurium on the surface of the membran...

Embodiment 3

[0064] Will refer to image 3 To illustrate this embodiment. In the same manner as in Example 1, a low-oxidation antimony film as a heat-sensitive material layer 302 was formed on a substrate 301 including silicon by a magnetron sputtering process ( image 3 (a)). After that, in order to prevent the occurrence of defects in the unexposed part due to the development process, the thermosensitive material layer 302 was subjected to an annealing process ( image 3 (b)). Here, the annealing treatment is performed by placing the substrate 301 on which the heat-sensitive material layer 302 is formed in a cleaning furnace. By measuring the temperature of the thermosensitive material layer 302 and using the same recording device as in Example 1, a minute crystalline portion was formed in the thermosensitive material layer 302 ( image 3 (c)). Subsequently, the material thus obtained was soaked in a 2% tetramethylammonium hydroxide aqueous solution and then developed to remove the crystalli...

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Abstract

A method for producing a master disk 105 for an optical disk 110 includes a layer forming step of forming a heat-sensitive material layer 102 on a substrate 101, an exposure step of exposing the heat sensitive material layer 102 partially to a laser beam, and a pit and land pattern forming step of forming a pattern of pits and lands by means of the difference between the etching rates of the exposed portion and the unexposed portion of the heat-sensitive material layer 102. The heat-sensitive material layer 102 includes at least Sb and O. When the composition ratio of O is defined as x (atom %), x is 3 or more and 50 or less.

Description

Technical field [0001] The present invention relates to a method and the like for manufacturing a master disk such as an optical disc for reproducing information. Background technique [0002] Optical recording media for recording and reproducing information by irradiation of light beams have been widely used, and in the future, attention will also be focused on the improvement of its recording density. [0003] Recently, various optical discs capable of reproducing image / sound data and digital data with a large capacity have been developed. For example, research and development have been conducted to increase the storage capacity of an optical disc with a diameter of 12 cm to a high density of 23.2 to 30 GB. [0004] Optical discs are manufactured in large quantities by making a master disc or a template made from the master disc and then injection molding it. Traditionally, when manufacturing a master disk, an optical disk is formed by spin-coating a photosensitive material lay...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23F1/00G11B7/24G11B7/26
CPCG11B7/261
Inventor 川口优子大野锐二伊藤英一
Owner PANASONIC CORP
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