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A method and apparatus for processing nanoscopic structures

A technology for nano and positioning structures, which is applied in nanostructure manufacturing, nanotechnology, nanotechnology, etc., and can solve problems such as huge complexity

Inactive Publication Date: 2005-08-17
MATVICE EHF
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the complexity of such research is enormous

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  • A method and apparatus for processing nanoscopic structures
  • A method and apparatus for processing nanoscopic structures
  • A method and apparatus for processing nanoscopic structures

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Embodiment Construction

[0095] The present invention provides a growth processing unit and process control device for growing and etching nanostructures on large substrates or workpieces in an efficient manner. The nanostructures can be used in a wide range of applications, such as detection, computation and fabrication of chemicals or new nanostructures. The central concept of this processing cell is to obtain low-cost and flexible operation in a specialized research environment established within a research institute of a university or company.

[0096] The present invention generally relates to the growth and / or etching of any form of nanometer and up to micron-scale sized surfaces in enclosed or bonded processing cells (which are larger than these dimensions) in combination with the means required in the processing cells . The concept of the processing unit provides a convenient way to insert a special research protocol into the process control instrument, process the nanostructure and remove th...

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Abstract

The present invention relates to a method and apparatus for growing nanostructures in a controlled way, wherein the controlling comprises controlling the electron emitting tips used for the nanoscopic structure growth. Further, the present invention describes an integrated method and apparatus for growing a plurality of electron emitting tips and nanoscopic structures in the same growing process.

Description

technical field [0001] The present invention relates to a method and apparatus for simultaneously growing one or more nanoscopic structures in a controlled manner. Background technique [0002] Nanotechnology, nanoelectronics and nanobiology are rapidly growing fields of research and development that are expected to lead to many important discoveries and developments in the years to come. [0003] A major problem in nanotechnology is how to grow or etch nanostructures with a size of 0.1-50nm on large substrates or workpieces in a fast and reliable manner. It has recently been found that this can be done using a very time consuming procedure on a very small area of ​​a few square microns in any standard clean room equipped with electronic etching equipment and other growth apparatus. The standard method for resolving nano- and microstructures on surfaces has become the optical etching technique. Current UV optical technology spans dimensions on the order of 100-300 nm. New...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B62B1/00B82B1/00B82B3/00
CPCB82B3/00B82Y30/00B82Y40/00B82B1/00
Inventor 斯韦登·奥拉夫松
Owner MATVICE EHF