Nozzle cleaning device and substrate treating device

A technology for cleaning devices and nozzles, which is applied to spraying devices, devices for coating liquid on surfaces, cleaning methods and tools, etc., which can solve the problems of the deterioration of the state of the slit nozzle 100, and achieve the effect of promoting drying

Active Publication Date: 2005-09-21
DAINIPPON SCREEN MTG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The condition of the slit nozzle 100 after cleaning is also deteriorated by such deposits RL.

Method used

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  • Nozzle cleaning device and substrate treating device
  • Nozzle cleaning device and substrate treating device
  • Nozzle cleaning device and substrate treating device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0061] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

[0062] 1. The first form of implementation

[0063] figure 1 It is a perspective view showing the substrate processing apparatus 1 according to the present invention. also, figure 2 It is a side view showing the main configuration related to the coating process in the substrate processing apparatus 1 .

[0064] In addition, in figure 1 , for the convenience of illustration and description, the following definitions are made, the Z-axis direction represents the vertical direction, and the XY plane represents the horizontal plane, but they are only defined for the convenience of grasping the positional relationship, and do not limit each direction described below. The same applies to the following figures.

[0065] The substrate processing apparatus 1 is roughly divided into a main body 2 and a control unit 8. A rectangular glass s...

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Abstract

To improve washing effect in washing treatment of a discharge nozzle. A guide block 743 for approaching below a discharge port 41a of a slit nozzle 41 is provided at a washing section 74 for washing a slit nozzle 41. Gas nozzles 710 for blowing gaseous nitrogen and washing nozzles 750 for ejecting rinse liquid LQ are provided and further a suction mechanism sucks the lower part of the discharge port 41a of the slit nozzle 41. Thickness of the guide block 743 in a X-axis direction is made to be larger than the width of the discharge port 41a in the X-axis direction, and thereby adjustment is performed so that suction force by the suction mechanism may not directly act on the discharge port 41a. Thereby suction force of the suction mechanism can be raised and washing effect is improved.

Description

technical field [0001] The present invention relates to a nozzle cleaning device and a substrate processing device for cleaning a discharge nozzle which discharges a predetermined processing liquid. Background technique [0002] Substrates in which processing liquids such as resists are applied to the surfaces of glass square substrates for liquid crystals, semiconductor wafers, flexible substrates for thin-film liquid crystals, substrates for photomasks, substrates for color filters (hereinafter simply referred to as "substrates"), etc. Processing means are well known. By using such a substrate processing apparatus, the resist liquid is ejected from the ejection nozzles to form a coating film of the resist liquid on the surface of the substrate. [0003] Figure 18 to Figure 20 It is a schematic diagram showing step by step how adhered substances of the resist solution remain on the discharge nozzles as the coating process is repeated in the substrate processing apparatus ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B05C11/10B05B15/02B05C5/00B05C15/00B08B3/08H01L21/027
CPCB05C11/10B08B3/04G03F7/16H01L21/6715
Inventor 高木善则川口靖弘
Owner DAINIPPON SCREEN MTG CO LTD
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