Process for production of etching or cleaning fluids

A manufacturing method and solution technology, applied in the preparation of detergent mixture compositions, detergent compositions, chemical instruments and methods, etc., can solve problems such as difficulties in preparing concentrated solutions

Inactive Publication Date: 2006-04-12
DAIKIN IND LTD
View PDF3 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, since hydrofluoric acid and amines, especially the salts with ammonia, are poorly soluble in organic solvents, the preparation of concentrated solutions with low water contents is particularly difficult

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1～2、 comparative example 1～2

[0079] In 1L organic solvent (IPA), add 50% HF (HF: 0.0067 mol) and 40% NH respectively as shown in Table 1 4 F(NH 4 F: 0.0067 mol), the state of crystallization and the electrical conductivity of the resulting etching solution due to the difference in the order of addition to IPA are shown in Table 1.

[0080] The method of adding to IPA is as follows.

[0081] While stirring 1 L of the organic solvent (IPA), 50% HF aqueous solution was slowly dropped. Then add 40% NH 4 The F aqueous solution was dripped slowly.

[0082] Table 1

[0083] 50%HF / 40%NH 4 f

Embodiment 3～5

[0085] Mix 50% HF aqueous solution with 40% NH 4 F aqueous solution with 50% HF aqueous solution (32.0g) and 40% NH 4 F aqueous solution (73.6g) was mixed to prepare HF and NH 4 F equimolar aqueous solution.

[0086] Mix 1 L of organic solvent (IPA) and the previous HF / NH 4 F Equimolar aqueous solutions are all mixed. IPA and HF / NH 4 Since F was not completely dissolved, it separated and crystallized, and stirred and dissolved until the conductivity of the supernatant was 400 μS / cm or more.

[0087] When the conductivity of the supernatant reached above 400 μS / cm, the supernatant and the crystallization fraction were separated by filtration.

[0088] Mix the IPA and supernatant, and adjust the concentration of the corrosion solution by monitoring the conductivity. The results are shown in Table 2.

[0089] Table 2

[0090] High concentration of NH 4 Conductivity of FHF·IPA supernatant

Embodiment 6 and comparative example 3

[0092] Add powdered NH to organic solvent (IPA) 1L 4 Table 3 shows the state of crystallization due to the difference in the order of addition of F·HF and water to IPA and the conductivity of the resulting etching solution.

[0093] Add 5.0 g of water to 1 L of organic solvent (IPA) and stir, then add powdered NH 4 F·HF0.38g and stir well.

[0094] Also, add powdered NH to 1 L of organic solvent (IPA) 4 After 0.38 g of F·HF was stirred, 5.0 g of water was added and stirred well.

[0095] table 3

[0096] Powder NH 4 F·HF and water

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates lo a method for producing an etching or cleaning solution comprising (1) at least one member selected from the group consisting of fluoride salts and bifluoride salts formed from at least one member selected from the group consisting of ammonia, hydroxylamines, aliphatic amines, aromatic amines, aliphatic quaternary ammoniums and aromatic quaternary ammoniums with hydrofluoric acid; (2) at least one heteroatom-containing organic solvent; and (3) water, the method comprising the steps of: step 1: mixing an aqueous hydrofluoric acid solution with at least one heteroatom-containing organic solvent, and step 2: mixing the mixture obtained in step 1 with at least one member selected from the group consisting of ammonia, hydroxylamines, aliphatic amines, aromatic amines, aliphatic quaternary ammoniums, aromatic quaternary ammoniums, and fluorides thereof.

Description

technical field [0001] The present invention relates to a method for producing an etching or cleaning solution. Background technique [0002] Conventionally, various etching or cleaning compositions containing hydrofluoric acid salts and organic solvents have been used (JP-A-2000-164585, JP-A-2000-164586, JP-A-2001-326948). [0003] However, since hydrofluoric acid and amines, especially salts with ammonia, are difficult to dissolve in organic solvents, the preparation of concentrated solutions with low water contents is particularly difficult. [0004] An object of the present invention is to provide a method for easily preparing an etching or cleaning solution. Contents of the invention [0005] The present invention provides the following methods for producing etching or cleaning solutions. [0006] 1. A method for producing a solution for corrosion or cleaning, the solution containing (1) a compound selected from the group consisting of ammonia, hydroxylamines, aliph...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/306C11D7/32C09K13/00C11D7/04C11D7/06C11D7/08C11D7/10C11D7/26C11D11/00C11D17/08H01L21/02H01L21/304H01L21/308
CPCC11D7/06C11D7/08C11D11/0047H01L21/02052C11D7/3209C11D7/10C09K13/00C11D7/32H01L21/306H01L21/31111
Inventor 陶山诚毛塚健彦板野充司
Owner DAIKIN IND LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap