Method for adjusting compositions of developing solution, and toning system
A developing system and developing solution technology, applied in the field of developing systems, can solve the problems of low photoresist composition in the developing solution, affecting the developing effect, etc., and achieve the effect of simple photoresist concentration and improving yield rate
Inactive Publication Date: 2006-04-19
AU OPTRONICS CORP
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Problems solved by technology
For example, when developing the photoresist pattern of the via (via), since the photoresist pattern of the via (via) is simple, the photoresist material washed out is very little. The composition will be too low, which will affect the developing effect
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Embodiment Construction
[0046] refer to figure 1 , which shows that the developing system 1 of the present invention includes a first developing machine 100 and a second developing machine 200 . The first developing unit 100 includes a first developing tank 110, a first developing solution collecting pipe 111, a first developing solution circulating tank 120, a first developing solution supply pipe 121, a first pump 122, a first The photoresist concentration sensor 123 , a first waste liquid pipe 131 and a first waste liquid control valve 132 . The second developing unit 200 includes a second developing tank 210, a second developing solution collecting pipe 211, a second developing solution circulating tank 220, a second developing solution supply pipe 221, a second pump 222, a second developing solution The photoresist concentration sensor 223 , a second waste liquid pipe 231 and a second waste liquid control valve 232 .
[0047] The first developing tank 110 communicates with the first developing...
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The developing system includes a first and second developing platform, a communicating tube and a waste tank. The first developing platform includes a first developer tank, a first encircling groove for developing solution, a first waste pipe and a first control valve for waste solution. The first developer tank is connected to the first encircling groove; and the first waste pipe is connected to the first encircling groove. The first control valve is setup at the first waste pipe. Similarly, second platform includes a second developer tank, a second encircling groove, a second waste pipe and a second control valve. The second developer tank is connected to the second encircling groove; and the second waste pipe is connected to the second encircling groove. The second control valve is setup at the second waste pipe. Communicating pipe connects first and second encircling grooves for developing solution. Waste tank connects first and second waste pipes.
Description
Technical field: [0001] The invention relates to a developing system, in particular to a developing system capable of controlling the photoresist concentration in the developing solution. Background technique: [0002] In the development process, the photoresist component in the developer (the photoresist material washed out from the photoresist pattern during the development process) has a direct relationship with the development effect of the developer. When the photoresist concentration in the developer is too low, the developing effect of the developer will be reduced, and the photoresist pattern cannot be accurately developed. Since the photoresist patterns to be processed in each manufacturing process are different, and since the photoresist components in the developer come from the photoresist materials washed out from the photoresist patterns during the development process, different manufacturing The photoresist concentration of the developer solution in the proces...
Claims
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IPC IPC(8): G03F7/30G03F7/26
Inventor 李易昌林奇峰徐启源
Owner AU OPTRONICS CORP