Method and equipment for monitoring developing liquid
A technology for monitoring equipment and developing solution, which is applied in the field of developing solution monitoring methods and equipment, can solve the problems of developing solution waste, developing effect evaluation of developing solution, and difficulty in intuitively and accurately reflecting the developing effect of developing solution, so as to reduce production costs, The effect of improving quality
Active Publication Date: 2014-08-13
BOE TECH GRP CO LTD
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Problems solved by technology
However, since the component distribution ratios of different developers are also different, the existing developer monitoring system is difficult to intuitively and accurately reflect the developing effect of the developer because it monitors multiple components in the developer
If the developing solution monitoring system cannot visually and effectively evaluate the developing effect of the developing solution, it will inevitably lead to waste of developing solution or poor developing effect of the developing solution.
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[0021] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0022] The developer solution monitoring device 10 provided by the embodiment of the present invention, such as figure 1 As shown, it includes a developer tank 11 for holding a developer, and a light-permeable substrate support frame 13 for placing a substrate 12 to be developed in the developer tank 11; wherein, the substrate 12 to be developed is coated with the first A photoresist 121 of one color. Such as figure 1 shown, also includes:
[0023] The phot...
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Abstract
Embodiments of the present invention provide a developing solution monitoring method and equipment, which relate to the technical field of liquid crystal display and can effectively and accurately monitor the developing effect of the developing solution. The equipment includes: a developing solution tank, a substrate supporting frame for placing a substrate to be developed; a photoresist of a first color is coated on the substrate to be developed; emitting detection light to the development area of the substrate to be developed within a specified time after immersion in the developing solution; and a processing unit electrically connected to the light detection unit, used to determine the occurrence of development in the development area according to the detection light A time interval. If it is determined that the time interval is not within the preset time range, it is determined that the developing solution is invalid. The embodiment of the present invention is used for monitoring the developing effect of the developing solution.
Description
technical field [0001] The invention relates to the technical field of liquid crystal display, in particular to a developer monitoring method and equipment. Background technique [0002] During the production process of TFT-LCD (Thin Film Transistor-Liquid Crystal Display, Thin Film Field Effect Transistor-Liquid Crystal Display), it is usually necessary to form a circuit pattern on the array substrate through a patterning process. Development is an important process in the patterning process, and the exposure pattern will only appear through the action of the developer. Through a certain chemical reaction, the developer can develop and etch away the unnecessary part of the photoresist in the pattern formed after the mask plate is exposed on the transparent substrate. In order to ensure the effect of development, the quality of the developer is particularly important. In most of the existing development systems, the developer is recycled. As the number of times the develope...
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IPC IPC(8): G03F7/30
CPCG03F7/32G03G15/105G03F7/30
Inventor 王灿王伟杰何璇
Owner BOE TECH GRP CO LTD