Method and equipment for monitoring developing liquid
A technology for monitoring equipment and developing solution, applied in the field of developing solution monitoring method and equipment, can solve the problems of waste of developing solution, evaluation of developing effect of developing solution, poor developing effect of developing solution, etc., and achieve the effect of reducing production cost and improving quality
Active Publication Date: 2012-12-19
BOE TECH GRP CO LTD
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Problems solved by technology
However, since the component distribution ratios of different developers are also different, the existing developer monitoring system is difficult to intuitively and accurately reflect the developing effect of the developer because it monitors multiple components in the developer
If the developing solution monitoring system cannot visually and effectively evaluate the developing effect of the developing solution, it will inevitably lead to waste of developing solution or poor developing effect of the developing solution.
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[0021] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0022] The developer solution monitoring device 10 provided by the embodiment of the present invention, such as figure 1 As shown, it includes a developer tank 11 for holding a developer, and a light-permeable substrate support frame 13 for placing a substrate 12 to be developed in the developer tank 11; wherein, the substrate 12 to be developed is coated with the first A photoresist 121 of one color. Such as figure 1 shown, also includes:
[0023] The phot...
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Abstract
An embodiment of the invention provides a method and equipment for monitoring developing liquid, and relates to the technical field of liquid crystal display. A developing effect of the developing liquid can be effectively and accurately monitored. The equipment comprises a developing liquid tank, a substrate supporting frame for placing a substrate to be developed, a light detecting unit and a treatment unit, wherein photoresist in a first color is coated on the substrate to be developed; the light detecting unit transmits detecting light rays to a developing region of the substrate to be developed within a set time after the substrate to be developed is soaked in the developing liquid; and the treatment unit is electrically connected with the light detecting unit, is used for determining developing time intervals of the developing region according to the detecting light rays, and determines that the developing liquid fails if the time intervals are not within a preset time range. The method and the equipment are used for monitoring the developing effect of the developing liquid.
Description
technical field [0001] The invention relates to the technical field of liquid crystal display, in particular to a developer monitoring method and equipment. Background technique [0002] During the production process of TFT-LCD (Thin Film Transistor-Liquid Crystal Display, Thin Film Field Effect Transistor-Liquid Crystal Display), it is usually necessary to form a circuit pattern on the array substrate through a patterning process. Development is an important process in the patterning process, and the exposure pattern will only appear through the action of the developer. Through a certain chemical reaction, the developer can develop and etch away the unnecessary part of the photoresist in the pattern formed after the mask plate is exposed on the transparent substrate. In order to ensure the effect of development, the quality of the developer is particularly important. In most of the existing development systems, the developer is recycled. As the number of times the develope...
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IPC IPC(8): G03F7/30
CPCG03F7/32G03G15/105G03F7/30
Inventor 王灿王伟杰何璇
Owner BOE TECH GRP CO LTD