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A kind of polyfunctional monomer compound and its preparation method and photosensitive resin composition

A technology for multifunctional monomers and compounds, applied in the fields of multifunctional monomer compounds and their preparation, and photosensitive resin compositions, can solve problems such as wall hanging, pigment sedimentation, gelation, etc., and achieve increased adhesion and storage stability. Improve and ensure the effect of developing performance

Active Publication Date: 2022-03-22
GUAN ETERNAL MATERIAL TECH +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, with the addition of such substances, the dispersion stability of the color paste in the color photoresist will be affected. In severe cases, gelation, pigment sedimentation, and wall hanging will occur. Even if it is slightly affected, the color photoresist will be affected. Viscosity increases significantly, affecting production line coating

Method used

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  • A kind of polyfunctional monomer compound and its preparation method and photosensitive resin composition
  • A kind of polyfunctional monomer compound and its preparation method and photosensitive resin composition
  • A kind of polyfunctional monomer compound and its preparation method and photosensitive resin composition

Examples

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preparation example Construction

[0038] According to the present disclosure, the preparation method of the intermediate compound represented by formula (14) may comprise: under the conditions of dehydration reaction, contacting the compound represented by formula (15) with the compound represented by formula (16);

[0039]

[0040] Among them, R 1 It can be an alkyl group with 1-10 carbon atoms, a haloalkyl group with 1-10 carbon atoms, or a substituted or unsubstituted aryl group with 6-10 carbon atoms, and the substituent in the substituted aryl group is Alkyl groups with 1-5 carbon atoms;

[0041]In order to improve the reaction conversion rate, preferably, the molar ratio of the compound shown in the formula (15) to the compound shown in the formula (16) can be 1:(0.5-2), more preferably 1:(0.7-1.5 ); the reaction conditions of the dehydration reaction may be: the reaction temperature is 0-60°C, the reaction time is 0.5-3h, and the more preferred reaction conditions may be: the reaction temperature is...

Embodiment 1

[0055] This example is used to illustrate the preparation method of the polyfunctional monomer compound of the present disclosure.

[0056] 1. Prepare medicines: trifluoromethanesulfonic acid and dimethyl dihydroxy silicon (molar ratio 2:1), some dehydrating agents. Use a flask as a reaction vessel, the reaction temperature is 30°C, in the presence of dehydrating agent titanium tetrachloride, slowly drop trifluoromethanesulfonic acid into dimethyl dihydroxy silicon, continue the reaction for 1 hour after the drop is completed, and then cool to room temperature Take out to obtain intermediate compound C1;

[0057] 2. Add dipentaerythritol pentaacrylate dropwise to intermediate compound C1, control the molar ratio of intermediate compound C1 and dipentaerythritol pentaacrylate to 1:1, and add a dehydrating agent to the system at the same time. Use a flask as a reaction vessel, the reaction temperature is 60°C, continue the reaction for 1 hour after the dropwise addition is comp...

Embodiment 2

[0061] Using the method of Example 1, the difference is that trifluoromethanesulfonic acid is replaced by an equivalent amount of benzenesulfonic acid to obtain the multifunctional monomer compound A2 of this example (yield 82%; 1 H NMR (400MHz, CDCl 3 , ppm), δ=7.62-7.86 (5H, t), 0.14 (6H, s), 3.71-4.07 (16H, t), 5.59-6.27 (15H, t)).

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PUM

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Abstract

The disclosure relates to a multifunctional monomer compound, a preparation method thereof, and a photosensitive resin composition. The compound has a structure represented by formula (1); formula (1). The multifunctional monomer compound of the present disclosure can produce acid when it encounters water in the development process, and promote the development of the unexposed part; and for the exposed part, the multifunctional monomer compound can participate in polymerization, and can be combined with other components in the photoresist composition. The polymer components are cross-linked to form a network structure, which will not affect the stability of the cured resin film due to acid production. At the same time, the compound produced after hydrolysis of the multifunctional monomer compound contains silicon hydroxyl groups, which can also increase the bond between the cured resin film and the glass substrate. Adhesion. At the same time, since the multifunctional monomer compound itself does not have acidity, the storage stability of the color photoresist that generally contains small molecular acids or acidic substances as developing aids is significantly improved.

Description

technical field [0001] The present disclosure relates to the field of liquid crystal display, in particular, to a multifunctional monomer compound, a preparation method thereof, and a photosensitive resin composition. Background technique [0002] The color filter is a key device for liquid crystal display to achieve colorization, and the performance of the color photoresist used to prepare the color filter directly affects the display effect of the liquid crystal display. As the color purity of the liquid crystal display is required to increase, when the concentration of the colorant contained in the photosensitive resin composition becomes higher, the developing performance of the coating film will decrease accordingly, which requires the photosensitive resin composition to have good developing performance. And the film formed by the resin composition is required to have good storage stability. [0003] In order to improve the development performance of the color photores...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C07F7/18C07F9/09G03F7/027
CPCG03F7/027C07F9/095
Inventor 孙涛刘永祥朱海龙任雪艳
Owner GUAN ETERNAL MATERIAL TECH