Movable universal eva porating source apparatus for vacuum system

Abstract

The invention discloses the moving, universal ablating source setting used in the vacuum system, it includes the pole which can insert and draw, the receiving and the supporting part, the vaporizing source part and the receiving part of the carrying and the receiving pole; the said pole which can insert and draw is fixed insulating on the receiving and the supporting part and is connected with the ablating source, the said receiving and the supporting part are fixed with the supporting mouth connecting the receiving desk of the vaporizing source, the connecting setting connecting the carrying pole is fixed on the receiving part of the carrying pole, the two ends of the vaporizing source are connected with the supporting and the receiving pert and the receiving part of the carrying pole respectively. The invention is composed of the pole, the receiving and the supporting part, the vaporizing source setting and the receiving part of the carrying pole, the receiving part of the carrying pole is fixed with the worm hole using for connecting the carrying hole, so the invention setting can be carried to the room of developing and the producing the film by the carrying pole without the wreck of the vacuum condition.

Description

technical field [0001] The invention relates to the field of film growth and preparation in a vacuum system, especially molecular beam epitaxy equipment. Background technique [0002] Vacuum physical deposition technology is widely used in the growth of thin films and the preparation of various nanostructures. Generally, the materials to be evaporated are formed into a stable atomic beam through resistance thermal evaporation or electron beam evaporation devices, and then deposited on the substrate to form Thin films or nanostructures. Traditional evaporation source devices, including resistance thermal evaporation and electron beam evaporation devices, are fixed on the fixed window of the vacuum system through flange windows and bolt structures, and their electrodes are outside the vacuum chamber and integrated with the evaporation source in the vacuum chamber. All The evaporation direction of the evaporation source points to the sample substrate, and only one evaporation ...

AI Technical Summary

Problems solved by technology

However, for research-type equipment, such as molecular beam epitaxy systems, it is often necessary to prepare thin films of different materials, so that many evaporation sources need to be installed, and more evaporation sources will take up more space and double the cost. At the same time, due to the limited window for installing the evaporation source, it is sometimes necessary to break the vacuum in order to replace the evaporation source, and then bake the entire molecular beam epitaxy system to restore the vacuum, which often takes more than a week. Problems of high cost and low efficiency

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