Movable universal eva porating source apparatus for vacuum system

A technology of vacuum system and evaporation source, which is applied in the direction of vacuum evaporation plating, ion implantation plating, metal material coating process, etc., and can solve the problems of multi-space, low efficiency, and increased cost.

Inactive Publication Date: 2006-10-25
INST OF PHYSICS - CHINESE ACAD OF SCI
View PDF0 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, for research-type equipment, such as molecular beam epitaxy systems, it is often necessary to prepare thin films of different materials, so that many evaporation sources need to be installed, and more evaporation sources will take up more space and double the cost. At the same time, due t...

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Movable universal eva porating source apparatus for vacuum system
  • Movable universal eva porating source apparatus for vacuum system
  • Movable universal eva porating source apparatus for vacuum system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0016] Such as figure 1 As shown, the movable and universal evaporation source device used in the vacuum system of the present invention includes a pluggable electrode 1, a receiving and supporting part 2, an evaporation source 3, an evaporation source adjustment frame 4, an evaporation source fixing frame 5 and a transmission rod receiving Part 6;

[0017] Such as image 3 As shown, the geometric center of the receiving and supporting part 2 is provided with a support port 23 for connecting to the receiving platform, and the outside of the support port 23 is provided with electrode sockets 22 and fixed ports 21 in sequence, and the number of electrode sockets 22 corresponds to the number of electrodes 1, The electrode socket 22 includes two outer holes and a middle hole located between the two outer holes. Ceramic insulating sheets 7 closely matched with the outer holes are arranged in the two outer holes. The thickness of the ceramic insulating sheets 7 is greater than the ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses the moving, universal ablating source setting used in the vacuum system, it includes the pole which can insert and draw, the receiving and the supporting part, the vaporizing source part and the receiving part of the carrying and the receiving pole; the said pole which can insert and draw is fixed insulating on the receiving and the supporting part and is connected with the ablating source, the said receiving and the supporting part are fixed with the supporting mouth connecting the receiving desk of the vaporizing source, the connecting setting connecting the carrying pole is fixed on the receiving part of the carrying pole, the two ends of the vaporizing source are connected with the supporting and the receiving pert and the receiving part of the carrying pole respectively. The invention is composed of the pole, the receiving and the supporting part, the vaporizing source setting and the receiving part of the carrying pole, the receiving part of the carrying pole is fixed with the worm hole using for connecting the carrying hole, so the invention setting can be carried to the room of developing and the producing the film by the carrying pole without the wreck of the vacuum condition.

Description

technical field [0001] The invention relates to the field of film growth and preparation in a vacuum system, especially molecular beam epitaxy equipment. Background technique [0002] Vacuum physical deposition technology is widely used in the growth of thin films and the preparation of various nanostructures. Generally, the materials to be evaporated are formed into a stable atomic beam through resistance thermal evaporation or electron beam evaporation devices, and then deposited on the substrate to form Thin films or nanostructures. Traditional evaporation source devices, including resistance thermal evaporation and electron beam evaporation devices, are fixed on the fixed window of the vacuum system through flange windows and bolt structures, and their electrodes are outside the vacuum chamber and integrated with the evaporation source in the vacuum chamber. All The evaporation direction of the evaporation source points to the sample substrate, and only one evaporation ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C23C14/24
Inventor 刘慧赵宏武陈东敏
Owner INST OF PHYSICS - CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap