[pixel structure and fabricating method thereof]

Abstract

A pixel structure and a fabricating method thereof are disclosed. The pixel structure is disposed on a substrate. The pixel structure comprises a scan line, a data line, an active element, a capacitor electrode, a pixel electrode and an electric field shielding layer. The fabricating method of the pixel structure comprises forming the scan line, the data line and the active element on the substrate first. The scan line and the data line are electrically coupled to the active element. Then, the capacitor electrode and the electric field shielding layer are formed on the substrate. Finally, the pixel electrode is formed on the substrate, covering the capacitor electrode and electrically coupled to the active element. The pixel electrode and the capacitor electrode form a pixel storage capacitor. The electric field shielding layer can avoid the interference between the data line and the pixel electrode.

Description

CROSS REFERENCE TO RELATED APPLICATIONS [0001] This application claims the priority benefit of Taiwan application serial no. 92134284, filed on Dec. 5, 2003. BACKGROUND OF INVENTION [0002] 1. Field of the Invention [0003] The present invention relates to a structure of a pixel and a fabricating method thereof, and more particularly to a structure of a pixel with an electrical field shielding layer between a data line and a pixel electrode for avoiding the interference between the data line and the pixel electrode, and a fabricating method thereof. [0004] 2. Description of the Related Art [0005] Thin Film Transistor Liquid Crystal Display (TFT LCD) comprises a thin film transistor array substrate, a color filter array substrate and a liquid crystal layer. The thin film transistor array substrate is composed of a plurality of pixels arranged in arrays. Each pixel comprises a thin film transistor, a pixel electrode and pixel storage capacitor. The thin film transistor comprises a gate ...

AI Technical Summary

Benefits of technology

[0010] Another object of the present invention is to provide a structure of a pixel and a fabricating method thereof to increase the aperture ratio of the pixel.

[0011] Yet another object of the present invention is to provide a simple method of forming a structure of a pixel structure.

[0012] A further object of the present invention is to provide a structure of a pixel and a fabricating method thereof to increase the capacitance of the pixel storage capacitor.

[0025] Accordingly, the structure of the pixel of the present invention and the fabricating method thereof have following advantages: (1) The pixel electrode and the data line do not interfere with each other. (2) The process can be simplified. (3) The transparent material of the pixel storage capacitor can substantially improve the aperture ratio. (4) The multi-layer pixel storage capacitor has desired capacitance. (5) They are adapted for the high-resolution liquid crystal displays.

Problems solved by technology

However, because the prior pixel storage capacitor uses the opaque metal layer as the capacitor electrode, it substantially reduces the aperture ratio of the pixel storage capacitor, reducing brightness of the displays.

However, the capacitance of the structure is reduced because of the shrinkage thereof.

If the distance between the pixel electrode 152 and the transparent electrode 154 is reduced, the capacitance of the pixel storage capacitor 150 is enhanced, but the interference between the pixel electrode 152 and the data line 130 arises, resulting in the worse performance of the liquid crystal displays.

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