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a technology of composition and polishing method, applied in the field of polishing composition, can solve problems such as polishing composition
Inactive Publication Date: 2005-06-23
FUJIMI INCORPORATED
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[0009] Accordingly, an object of the present invention is to provide a polishing composition that can be suitably used in applications for polishing a glass substrate. Another object of the present invention is to provide a polishing method using such a polishing composition.
Problems solved by technology
The first and second prior art polishing compositions, however, do not satisfy the above requirements, and are thus susceptible to improvement.
Method used
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[0013] One embodiment of the present invention will now be described.
[0014] A glass substrate for an information-recording medium, such as a magnetic disc, is formed of, for example, aluminosilicate glass, soda lime glass, soda aluminosilicate glass, almino borosilicate glass, borosilicate glass, quartz glass, or crystallized glass. The main crystal phase of the crystallized glass may be spodumene, mullite, aluminum borate crystal, β-quartz solid solution, α-quartz, cordierite, enstatite, celsian, wollastonite, anorthite, forsterite, lithium metasilicate, or lithium disilicate. A glass substrate is usually provided to a chemical machine polishing (CMP) process so as to have the surface thereof mirror-finished.
[0015] Typically, the process of polishing a glass substrate is divided into a plurality of polishing steps to be conducted, for the purpose of improving the stock removal rate, as well as the quality of the surface of the polished glass substrate. The plurality of polishing ...
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Abstract
A polishing composition of the present invention contains silicon dioxide, an acid, and water. Silicon dioxide is, for example, colloidal silica, fumed silica, or precipitated silica. The acid is, for example, hydrochloric acid, phosphoric acid, sulfuric acid, phosphonic acid, nitric acid, phosphinic acid, boric acid, acetic acid, itaconic acid, succinic acid, tartaric acid, citric acid, maleic acid, glycolic acid, malonic acid, methanesulfonic acid, formic acid, malic acid, gluconic acid, alanine, glycin, lactic acid, hydroxyethylidene diphosphonic acid, nitrilotris(methylene phosphonic acid), or phosphonobutane tricarboxylic acid. The pH of the polishing composition is preferably in the range of 0.5 to 6. The polishing composition can be suitably used in applications for polishing a glass substrate.
Description
BACKGROUND OF THE INVENTION [0001] The present invention relates to a polishing composition for use in polishing of a glass substrate for an information-recording medium, which is used for a hard disk and the like. The present invention also relates to a polishing method using such a polishing composition. [0002] Conventionally, there is a known polishing composition for use in applications for polishing a glass substrate for an information-recording medium. Japanese Laid-Open Patent Publication No. 2001-89748 discloses a polishing composition (hereinafter referred to as the first prior art polishing composition) containing an abrasive mainly composed of a rare earth oxide such as cerium oxide, and water. Japanese Laid-Open Patent Publication No. 2000-144112 discloses a polishing composition (hereinafter referred to as the second prior art polishing composition) containing an abrasive that comprises at least one selected from the group consisting of an iron-containing oxide and an i...
Claims
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Application Information
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Patent Type & Authority Applications(United States)