High polarization ferroelectric capacitors for integrated circuits

a high-polarization, ferroelectric capacitor technology, applied in the direction of capacitors, semiconductor devices, electrical apparatus, etc., can solve the problems of destructive read operation, achieve high switching polarization, facilitate ferroelectric switching properties, and avoid read operation

Inactive Publication Date: 2005-07-07
TEXAS INSTR INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0014] Typically, a ferroelectric material undergoes a crystal phase transition as it drops below the Curie temperature. Above the Curie temperature, the domains are generally symmetric and exhibit paraelectric properties (no ferroelectric behavior). Below the Curie temperature, the crystal becomes tetragonal and the domains become generally asymmetric, wherein the material exhibits spontaneous polarization that facilitates ferroelectric switching properties. Ordinarily, the domains are randomly oriented, meaning that only about ⅓ are functionally aligned with respect to a ferroelectric capacitor. As the substrate cools, thermal stresses are created due to the mismatched coefficients of thermal expansion in layers adjacent the ferroelectric core. According to the invention, the thermal stresses are large enough and the cooling occurs slowly enough that a signficant portion of the domains reorient to relieve thermal stresses. The resulting ferroelectric cores have a higher switched polarization than ferroelectric cores found in prior art integrated circuits. The higher switched polarization allows the memory cells to be made smaller and more densely packed.
[0015] Another aspect of the invention relates to an array of ferroelectric memory cells, each cell comprising a capacitor stack having a ferroelectric core, the ferroelectric cores having asymmetric domains with one axis of polarity, wherein from about 40 to about 90% of the domains are functionally oriented with respect to the capacitor stack. According to a further aspect of the invention, metal plugs filling vias in a dielectric layer over the ferroelectric cores have an area about equal to or greater than that of the ferroelectric cores. The metal in the vias adds to the thermal stresses that reorient the domains during cooling.

Problems solved by technology

A characteristic of the illustrated ferroelectric memory cell is that if the polarization of the ferroelectric is switched, the read operation is destructive and the sense amplifier must rewrite (onto that cell) the correct polarization value after the cell is read.

Method used

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  • High polarization ferroelectric capacitors for integrated circuits
  • High polarization ferroelectric capacitors for integrated circuits
  • High polarization ferroelectric capacitors for integrated circuits

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Embodiment Construction

[0021] The present invention will now be described with reference to the accompanying drawings in which like numbered elements represent like parts. The present invention can be used to fabricate stand-alone FeRAM devices or FeRAM devices integrated into a semiconductor chip that has many other device types.

[0022]FIG. 3 provides a schematic illustrating how stresses are applied according to the present invention to reorient the domains of a ferroelectric core 60. A stack 58 comprising the ferroelectric core 60, a material 62 above the ferroelectric core 60 and a material 64 below the ferroelectric core 60. The materials are stacked in the z-direction. One of, and preferably both of, the materials 62 and 64, have a larger coefficient of thermal expansion (CTE) than the ferroelectric core 60. As the materials are cooled below the temperatures at which they were formed, the materials 62 and 64 shrink faster than the ferroelectric core 60 and, through shear stresses, exert a compressiv...

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Abstract

One aspect of the invention relates to a method of manufacturing an integrated circuit comprising forming an array of ferroelectric memory cells on a semiconductor substrate, heating the substrate to a temperature near a Curie temperature of the ferroelectric cores, and subjecting the substrate to a temperature program, whereby thermally induced stresses on the ferroelectric cores cause a switched polarization of the cores to increase by at least about 25% as the cores cool to about room temperature. Embodiments of the invention include metal filled vias of expanded cross-section above and below the ferroelectric cores, which increase the thermal stresses on the ferroelectic cores during cooling.

Description

FIELD OF THE INVENTION [0001] The present invention relates generally to the field of integrated circuit manufacturing, and more particularly relates to ferroelectric RAM. BACKGROUND OF THE INVENTION [0002] Ferroelectric memory, and other types of semiconductor memory, are used for storing data and / or program code in personal computer systems, embedded processor-based systems, and the like. Ferroelectric memories are commonly organized in single-transistor, single-capacitor (1T1C) or two-transistor, two-capacitor (2T2C) configurations, in which data is read from or written to the device using address signals and various other control signals. The individual memory cells typically comprise one or more ferroelectric (FE) capacitors adapted to store a binary data bit, as well as one or more access transistors, typically MOS devices, operable to selectively connect the FE capacitor to one of a pair of complimentary bitlines, with the second bitline being connected to a reference voltage...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): H01L21/02H01L21/8246H01L27/115
CPCH01L27/11502H01L28/55H01L27/11507H10B53/30H10B53/00
Inventor MOISE, THEODORE S. IVSUMMERFELT, SCOTT R.UDAYAKUMAR, K.R.
Owner TEXAS INSTR INC
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