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Methods and apparatus for sealing an opening of a processing chamber

a technology of processing chamber and sealing method, which is applied in the direction of mechanical equipment, valve member-seat contact, basic electric elements, etc., can solve the problems of increasing the amount of stress and fatigue of the slit valve, and the conventional slit valve is not designed to accommodate large pressure differentials

Inactive Publication Date: 2006-11-09
APPLIED MATERIALS INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

This design effectively seals processing chamber openings under high pressure differentials, reducing the stress on the sealing components and enhancing the durability and efficiency of the sealing process.

Problems solved by technology

The slit valve thereby is subjected to stresses and fatigue, the amounts of which increase with the pressure differential.
Conventional slit valves typically are not designed to accommodate large pressure differentials.

Method used

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  • Methods and apparatus for sealing an opening of a processing chamber
  • Methods and apparatus for sealing an opening of a processing chamber
  • Methods and apparatus for sealing an opening of a processing chamber

Examples

Experimental program
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Embodiment Construction

[0015]FIGS. 1A-1C illustrate an embodiment of an apparatus in accordance with the present invention comprising a chamber isolation valve 101. Also, when considered in light of the discussion below, FIGS. 1A-1C illustrate an embodiment of an inventive method for using the chamber isolation valve 101 to seal an opening 102 (shown in phantom in FIG. 1A) to an adjacent processing chamber P (shown in phantom in FIG. 1A) so as to permit pressurization of the processing chamber P for processing of a substrate contained therein.

[0016] The chamber isolation valve 101 may include a closure member 103 for sealing the processing chamber opening 102. In addition, the chamber isolation valve 101 may comprise a valve housing 105 within which at least a portion of the closure member 103 may be movably disposed. To permit the chamber isolation valve 101 to be used in conjunction with an opening of a processing chamber, the valve housing 105 of the chamber isolation valve 101 may be placed against t...

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PUM

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Abstract

In one embodiment, a slit valve is provided that is adapted to seal an opening and that includes a valve housing having a first wall, a first opening formed in the first wall, a second wall and a second opening formed in the second wall. The slit valve also includes a closure member having a sealing portion adapted to contact the second wall and seal the second opening, and a bracing member moveable relative to the sealing portion and adapted to contact the first wall. The slit valve further includes at least one actuating mechanism adapted to (1) move the sealing portion toward the second wall and into contact with the second wall; and (2) move the bracing member away from the sealing portion and into contact with the first wall so as to brace the sealing portion against the second wall. Numerous other aspects are provided.

Description

[0001] This application is a continuation of and claims priority from U.S. patent application Ser. No. 10 / 844,974 filed May 12, 2004 which claims priority from U.S. Provisional Patent Application Ser. No. 60 / 470,140, filed May 13, 2003, each of which is hereby incorporated by reference herein in its entirety.FIELD OF THE INVENTION [0002] The present invention relates generally to semiconductor device manufacturing and more particularly to methods and apparatus for sealing an opening of a processing chamber. BACKGROUND OF THE INVENTION [0003] A substrate processing chamber typically communicates with a substrate transfer chamber through a sealable opening that is both wide and relatively short to accommodate insertion and removal of horizontally-oriented substrates. It is known to use a slit valve to seal such an opening. For example, a sealing plate of the slit valve may be extended to seal the opening, and retracted to permit passage of substrates through the opening. Slit valve de...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): F16K25/00F16K3/18F16K51/02H01L21/00
CPCF16K3/188H01L21/67126F16K51/02
Inventor KURITA, SHINICHILEE, KE LINGBLONIGAN, WENDELL T.
Owner APPLIED MATERIALS INC