Substrate processing apparatus

a processing apparatus and substrate technology, applied in the direction of photomechanical apparatus, instruments, photosensitive materials, etc., can solve the problem of not being able to make a resist pattern finer than
US20070071439A1Inactive Publication Date: 2007-03-29SOKUDO CO LTD
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Patent Information

Authority / Receiving Office
US · United States
Current Assignee / Owner
SOKUDO CO LTD
Publication Date
2007-03-29
Estimated Expiration
Not applicable · inactive patent

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Abstract

The transporting process from cleaning and drying processing of a substrate in a cleaning / drying processing unit in a cleaning / drying processing group to post-exposure bake (PEB) of the substrate in a thermal processing group for post-exposure bake in a cleaning / drying processing block is described below. First, after the substrate after exposure processing is subjected to the cleaning and drying processing in the cleaning / drying processing group, a sixth central robot takes out the substrate from the cleaning / drying processing group and carries that substrate into the thermal processing group for post-exposure bake in the cleaning / drying processing block.
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Description

BACKGROUND OF THE INVENTION

[0001] 1. Field of the Invention

[0002] The present invention relates to a substrate processing apparatus for applying processing to substrates.

[0003] 2. Description of the Background Art

[0004] A substrate processing apparatus is used to apply a variety of processing to substrates such as semiconductor substrates, substrates for use in liquid crystal displays, plasma displays, optical disks, magnetic disks, magneto-optical disks, photomasks, and other substrates. Such a substrate processing apparatus typically applies a plurality of successive processing to a single substrate.

[0005] The substrate processing apparatus as described in JP 2003-324139 A includes an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to the interface block as an external device separate from the substrate processing apparatus.

[0006] The index...

Claims

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