Pattern inspection device and pattern inspection method

Abstract

Disclosed is a pattern inspection device for inspecting a bit pattern of a disk medium having a plurality of tracks which are concentrically formed on the disk medium, the bit pattern on each track being spaced for each bit in radial and circumferential directions, the pattern inspection device including: a rotating stage on which the disk medium is placed; an irradiating optical system for radiating an electron beam onto the disk medium that rotates together with the rotating stage; and an electron detector for detecting electrons generated from the disk medium on the rotating stage by the irradiation of the electron beam of the irradiating optical system, wherein a spot diameter of the electron beam of the irradiating optical system is set not less than a diameter of the bit pattern.

Description

TECHNICAL FIELD[0001]The present invention relates to a pattern inspection device and a pattern inspection method that are applied when inspecting patterns formed on a disk medium.BACKGROUND ART[0002]As one of disk media used for magnetic recording and reproducing apparatuses, such as hard disk drive units, a disk medium that is called a “bit patterned medium” has been known. A plurality of recording tracks are concentrically formed on this kind of disk medium. Patterns constituting each track are spaced for each bit in the radial and circumferential directions of the disk medium. In this specification, a pattern that is spaced for each bit, as stated above, is called a “bit pattern”.[0003]Recently, an “imprint technique” has been utilized as a technique for forming the patterns on a disk medium. In the imprint technique, concavo-convex patterns are formed on a base disk medium called a stamper, and the concave and convex of the concavo-convex patterns are transferred from the stamp...

AI Technical Summary

Benefits of technology

The invention makes it easier to inspect patterns on disk media compared to using a scanning electron microscope.

Problems solved by technology

However, when producing a disk media with patterns, misalignment or dimensional variation could possibly occur in the finally-obtained bit patterns due to various factors during the lithography (exposure and development) process, or before and after the lithography process.

Therefore, if a disk medium having the bit patterns which are misaligned or varied in size beyond the clearance level is used for the base and imprinting, defective products are produced frequently.

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