Phase change memory devices and methods of manufacturing the same

a memory device and phase change technology, applied in the direction of bulk negative resistance effect devices, basic electric elements, electric devices, etc., can solve the problems of undesired conduction path not being formed, no efficient method of forming and/or arranging heat sinks, etc., to achieve the effect of enhancing heat absorption and reducing thermal disturbance between cells

Inactive Publication Date: 2013-12-05
SAMSUNG ELECTRONICS CO LTD
View PDF11 Cites 15 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0023]According to some embodiments, the heat sink may be formed between the lower electrodes spaced apart from each other at a relatively short distance, so that the thermal disturbance between cells may be substantially reduced. Additionally, the heat sink may be electrically insulated and spaced apart from the phase change memory unit including the lower electrode, the phase change material layer pattern and the upper electrode, and thus an undesired conduction path may not be formed. Furthermore, the heat sink may be formed adjacent to the plug under the lower electrode, so that heat from the phase change memory unit may be easily transferred to the plug, thereby enhancing the absorption of heat.

Problems solved by technology

In order to solve the problem, a heat sink absorbing Joule heat has been developed, however, there is no efficient method of forming and / or arranging the heat sink.
Additionally, the heat sink may be electrically insulated and spaced apart from the phase change memory unit including the lower electrode, the phase change material layer pattern and the upper electrode, and thus an undesired conduction path may not be formed.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Phase change memory devices and methods of manufacturing the same
  • Phase change memory devices and methods of manufacturing the same
  • Phase change memory devices and methods of manufacturing the same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0083]Various embodiments will be described more fully hereinafter with reference to the accompanying drawings, in which some embodiments are shown. The present inventive concept may, however, be embodied in many different forms and should not be construed as limited to the particular embodiments set forth herein. Rather, these embodiments are provided so that this description will be thorough and complete, and will fully convey the scope of the present inventive concept to those skilled in the art. In the drawings, the sizes and relative sizes of layers and regions may be exaggerated for clarity.

[0084]It will be understood that when an element or layer is referred to as being “on,”“connected to” or “coupled to” another element or layer, it can be directly on, connected or coupled to the other element or layer or intervening elements or layers may be present. In contrast, when an element is referred to as being “directly on,”“directly connected to” or “directly coupled to” another e...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

A phase change memory device includes a phase change memory unit and a heat sink. The phase change memory unit includes a phase change material layer pattern, a lower electrode beneath the phase change material layer pattern configured to heat the phase change material layer pattern, and an upper electrode on the phase change material layer pattern. The heat sink configured to absorb heat from the phase change memory unit. The heat sink has a top surface lower than a top surface of the upper electrode and is spaced apart from the phase change memory unit.

Description

CROSS-REFERENCE TO RELATED APPLICATION[0001]This application claims priority under 35 USC §119 to Korean Patent Application No. 10-2012-0059323, filed on Jun. 1, 2012 in the Korean Intellectual Property Office (KIPO), the contents of which are herein incorporated by reference in their entirety.BACKGROUND[0002]1. Field[0003]Embodiments relate to a phase change memory device and a method of manufacturing the same. More particularly, example embodiments relate to a phase change memory device having a heat sink and a method of manufacturing the same.[0004]2. Description of the Related Art[0005]In a phase change memory device, Joule heat generated in a lower electrode and / or a phase change material layer in a memory cell may affect the crystallization of a phase change material layer in adjacent memory cells to cause a thermal crosstalk. In order to solve the problem, a heat sink absorbing Joule heat has been developed, however, there is no efficient method of forming and / or arranging th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(United States)
IPC IPC(8): H01L45/00
CPCH01L45/1286H10B63/20H10B63/80H10N70/231H10N70/8413H10N70/8613H10N70/826H10N70/8828H10N70/066H10N70/011H10N70/8825H10N70/021
Inventor PARK, TAE-JINSONG, YOON-JONGCHUNG, CHIL-HEE
Owner SAMSUNG ELECTRONICS CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products