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Plasma coating device and method for plasma coating of a substrate

a technology of plasma coating and substrate, which is applied in the direction of coating, molten spray coating, chemical vapor deposition coating, etc., can solve the problems of difficult conveying of fine-grained powders, inability to break up processing gas streams, and inability to operate suitable types of pumps

Inactive Publication Date: 2017-06-08
MASCHFAB REINHAUSEN GEBR SCHEUBECK GMBH & CO KG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The present invention is about a device and method for plasma coating that can transport powder or a mixture of powder and processing gas from a reservoir to a processing chamber without pumps or other mechanical or pneumatic units. The device has a pressure gradient between the reservoir and the chamber, allowing for precise control of the particle delivery rate. The result is a more precise, homogeneous and stable powder conveyance between the reservoir and the chamber, leading to improved coating quality.

Problems solved by technology

The conveyance of such fine-grained powders is, however, challenging.
Furthermore, fine-grained powders tend to form agglomerates that a processing gas stream may not be able to break up.
Also, the operation of suitable types of pumps often becomes unstable when handling processing gases with high powder contents.
Pumps and conveyance devices are prone to heavy erosion and blockage depending on the powder used.
Also, the properties of the powder material itself have a significant impact.
This process is, however, very complex and not sufficiently reliable for powders prone to agglomeration.
Likewise, the problem remains unaddressed of how a constant extraction rate of deposition material is achieved.

Method used

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Embodiment Construction

[0026]At the outset, it should be appreciated that like drawing numbers on different drawing views identify identical, or functionally similar, structural elements of the invention. While the present invention is described with respect to what is presently considered to be the preferred aspects, it is to be understood that the invention as claimed is not limited to the disclosed aspect. The present invention is intended to include various modifications and equivalent arrangements within the spirit and scope of the appended claims.

[0027]Furthermore, it is understood that this invention is not limited to the particular methodology, materials and modifications described and as such may, of course, vary. It is also understood that the terminology used herein is for the purpose of describing particular aspects only, and is not intended to limit the scope of the present invention, which is limited only by the appended claims.

[0028]Unless defined otherwise, all technical and scientific ter...

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Abstract

The invention relates to a plasma coating device (10) and a method for homogenous coating of a substrate (12). It comprises a particle reservoir (14), a dosing device (16) for dosing the particles (15) contained in the particle reservoir (14), a processing chamber (20) and a transport line (18) to convey particles (15) into the processing chamber (20). The processing chamber pressure (P1) in the processing chamber (20) is lower than the particle reservoir pressure (P2) in the particle reservoir (14).

Description

CROSS-REFERENCE TO RELATED APPLICATIONS[0001]This application is a Continuation-in-Part patent application under 35 U.S.C. §120 of U.S. patent application Ser. No. 13 / 932,581, filed on Jul. 1, 2013, which claims priority from German Patent Application No. 10 2012 106 078.9, filed on Jul. 6, 2012, which applications are incorporated herein by reference in their entireties.FIELD OF THE INVENTION[0002]The invention relates generally to a plasma coating device, and more specifically to a plasma coating device for coating of a substrate,[0003]Furthermore, the invention generally relates to a method for plasma coating of a substrate.BACKGROUND OF THE INVENTION[0004]The state of the art comprises a diverse series of sample coating methods and devices. The methods may be selected according to the substrate, the layer to be coated thereon and in particular according to the layer thickness. Amongst suitable coating methods are, according to the initial state of the coating material, gas-phase...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): C23C4/134
CPCC23C4/134B05B7/1472B05B7/226B05B14/43C23C16/4486C23C16/513
Inventor NETTESHEIM, STEFAN
Owner MASCHFAB REINHAUSEN GEBR SCHEUBECK GMBH & CO KG
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