Organotin compositions having the formula RSnL3 and corresponding synthetic methods are described. R includes aromatic, cyclic and / or halogenated
ether moieties, or polyethers, and L includes hydrolysable groups. The organotin compositions may be formed as
radiation-patternable coatings on substrates. The coatings may have an average thickness from about 1 nm to about 75 nm and have the formula RSnOn(OH)3-2n, forming an oxo-hydroxo network, where R is a hydrocarbyl
ether group with 1 to 30 carbon atoms and 0<n<3 / 2, wherein regions of the
coating are soluble in 2-
heptanone in a
puddle development step following a bake at 150° C. for 120 seconds. The coatings may be
radiation-patternable using UV, EUV or
ion beam
radiation, and corresponding methods are described.