Photosensitive pad suitable for stamp and its prepn method
A technology for photosensitive pads and stamps, which is applied in the field of microporous foam materials and their preparation, can solve problems such as poor uniformity, large pore size of porous materials, and large investment, and achieve stable product quality, small pore size, and good uniformity.
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Embodiment 1
[0036] 70 parts by mass of polyethylene resin, 5.0 parts by mass of pigment carbon black, 3.0 parts by mass of tetrakis [3-(3'5'-di-tert-butyl-4'-hydroxyphenyl) propylene] pentaerythritol ester (1010 antioxidant) , 3.0 parts by mass of sorbitan monolaurate (Span 20), 5 parts by mass of stearic acid, 8 parts by mass of paraffin wax, 3 parts by mass of polyethylene wax, 2 parts by mass of calcium stearate, 7 parts by mass of paraffin oil , 400 parts by mass of calcium carbonate, mixed uniformly, molded, extruded, injection-molded to obtain the material embryo), the material embryo is immersed in a weight concentration of 1% aqueous hydrochloric acid for washing, calcium carbonate is removed, and a softer microporous photosensitive pad is obtained.
[0037] The size of the micropores is 10 microns, and the micropores are an open structure with an open rate of 95%.
[0038] Using this method to prepare a photosensitive seal, compared with the performance of the Wanshi seal, the re...
Embodiment 2
[0041] 90 parts by mass of polyethylene resin, 0.1 part by mass of pigment carbon black, 0.5 part by mass of 2,4,6-tri-tert-butylphenol (antioxidant 246), fatty alcohol polyoxyethylene (20) ether (Pingping plus O- 20) 0.5 parts by mass, 1 part by mass of stearic acid, 1 part by mass of paraffin wax, 1 part by mass of polyethylene wax, 2 parts by mass of paraffin oil, 400 parts by mass of calcium carbonate, mixed uniformly, molded, extruded, and injection molded to obtain a profile (Material embryo), the material embryo is immersed in the nitric acid aqueous solution that weight concentration is 0.5%, washes, and removes calcium carbonate, obtains than in example 1 harder microporous photosensitive pad.
[0042] The size of the micropores is 40 microns, and the micropores are an open structure with an open rate of 99%.
[0043] The photosensitive stamp prepared by this method is compared with the performance of the Wanshi stamp, and the results are as follows:
[0044] ...
Embodiment 3
[0046] The polyethylene resin in Example 1 was changed to copolymerized polypropylene resin to obtain a soft and hard microporous photosensitive pad similar to Example 2.
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