Method for manufacturing metal coupling
A metal bump and metal technology, applied in semiconductor/solid-state device manufacturing, electrical components, electric solid-state devices, etc., can solve problems such as lowering product reliability, insufficient uniformity of anisotropic conductive adhesive film 24, and affecting packaging quality. Achieve the effects of improving quality, improving joint effect, and reducing step height
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[0013] Referring to FIG. 2 to FIG. 7 , FIG. 2 to FIG. 7 are schematic diagrams of a method for manufacturing the metal bump 48 according to the first embodiment of the present invention. As shown in FIG. 2 , a substrate 30 is firstly provided. The substrate 30 can be a chip with internal components and circuits fabricated or a multilayer printed circuit board with internal circuit layout completed. The surface of the substrate 30 includes at least one pad metal 32 , an oxide layer 34 and a silicon nitride 36 . The bonding pad metal 32 is made of aluminum, and the oxide layer 34 and silicon nitride 36 combine to form a patterned protective layer 38 , the protective layer 38 covers part of the surface of the bonding pad metal 32 and exposes part of the surface of the bonding pad metal 32 . The oxide layer 34 and the silicon nitride 36 are respectively formed on the surface of the substrate 30 and the pad metal 32 through a deposition process. In this embodiment, the protection ...
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