Method for manufacturing metal coupling
A metal bump, metal technology, applied in semiconductor/solid-state device manufacturing, electrical components, electrical solid-state devices, etc., can solve problems such as reducing product reliability, affecting packaging quality, and the anisotropic conductive adhesive film 24 is not uniform enough, etc. Achieve the effect of improving quality, improving joint effect, and reducing step height
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[0013] refer to Figure 2 to Figure 7 , Figure 2 to Figure 7 It is a schematic diagram of the method for manufacturing the metal bump 48 according to the first embodiment of the present invention. Such as figure 2 As shown, a substrate 30 is firstly provided, and the substrate 30 can be a chip with internal components and circuits fabricated or a multilayer printed circuit board with internal circuit layout completed. The surface of the substrate 30 includes at least one pad metal 32 , an oxide layer 34 and a silicon nitride 36 . The bonding pad metal 32 is made of aluminum, and the oxide layer 34 and silicon nitride 36 combine to form a patterned protective layer 38 , the protective layer 38 covers part of the surface of the bonding pad metal 32 and exposes part of the surface of the bonding pad metal 32 . The oxide layer 34 and the silicon nitride 36 are respectively formed on the surface of the substrate 30 and the pad metal 32 through a deposition process. In this em...
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