Thin film diode liquid crystal display device panel

Abstract

On the thin film diode liquid crystal display device panel, the active element of controlling liquid crystal sequentially forms the metal layer, the clarity conduction thin film and the semiconductor insulating barrier on the base plate. Among them, the metal layer is used to pass the signal, the clarity conduction acts as the MIM capacitance's substrate metal layer. After that, define the require design of the metal layer, the clarity conduction thin film and the semiconductor insulating barrier. Then on the base plate, the metal layer, the clarity conduction thin film and the semiconductor insulating barrier forms the dielectric layer, and defines the MIM capacitance's position through the photoengraving technology. At last, on the dielectric layer forms another he clarity conduction layer, defines the picture element electrode and the MIM capacitance's superstratum metal layer through the photoengraving technology.

Description

technical field [0001] The invention relates to a thin film diode liquid crystal display panel, in particular to an active element for controlling a liquid crystal display of a thin film diode liquid crystal display and a manufacturing method thereof. Background technique [0002] The liquid crystal display mainly injects liquid crystal between two substrates, and then applies an appropriate voltage to change the deflection characteristics of the incident light. Through the control of each pixel, the liquid crystal display can achieve the expected pattern. The application of liquid crystal display has been quite common. In our daily life, liquid crystal displays are seen almost everywhere where information needs to be displayed. For example, monitors of desktop computers or notebook computers, displays of personal digital assistants, displays of handheld mobile communication products, displays of digital clocks, displays of office electronics or home appliances, and even i...

AI Technical Summary

Problems solved by technology

Since the scan line 12 and the semiconductor insulating layer 14 of the metal-insulating layer-metal structure have a climbing structure, the transparent conductive layer 16 has a poor structure in the process, such as Figure 1B Medium Defect 18

A breakdown voltage will be generated at the defect 18, resulting in a dead pixel of the pixel

However, this process is complex and the material is limited to tantalum metal which can be anodized

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