Multi-domain vertical orientation mode liquid crystal display device and substrate manufacturing method thereof

A liquid crystal display device, a technology of vertical alignment mode, which is applied in the photoengraving process of the pattern surface, the manufacture of semiconductor/solid-state devices, optics, etc., and can solve the problems of color inconsistency, chromatic aberration, affecting the viewing angle range and picture quality, etc.

Inactive Publication Date: 2007-12-19
上海广电光电子有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The specific performance is that the transmission ability under the oblique viewing angle is reduced, and the colors displayed in the direction of the oblique viewing

Method used

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  • Multi-domain vertical orientation mode liquid crystal display device and substrate manufacturing method thereof
  • Multi-domain vertical orientation mode liquid crystal display device and substrate manufacturing method thereof
  • Multi-domain vertical orientation mode liquid crystal display device and substrate manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0062] 4A is a schematic structural diagram of a common electrode on the upper substrate side in Embodiment 1 of the present invention; 4B is a schematic structural diagram of a pixel electrode in Embodiment 1 of the present invention.

[0063] 4A, 4B, the liquid crystal display device of multi-domain vertical display mode of the present invention comprises an upper substrate 20, a lower substrate 10 and a liquid crystal layer 30 filled between the upper and lower substrates 10 and 20; the display area of ​​the lower substrate 10 Contains a plurality of sub-pixel regions, pixel electrodes 12 and TFT devices (not shown in the figure) are arranged in the sub-pixels, slits or protrusions 11 are formed on the pixel electrodes 12; a common electrode 22 is formed on the surface of the upper substrate 20 , slits or protrusions 21 are formed on the common electrode 22 . The slit or protrusion 11 formed on the pixel electrode 12 is opposite to the slit or protrusion 21 on the common el...

Embodiment 2

[0074] FIG. 11 is a schematic diagram of the general manufacturing process and structure of the upper substrate.

[0075] Referring to Fig. 11A, first provide a transparent substrate 40, this transparent substrate 40 is a glass substrate or a plastic substrate; then form a black matrix (BM) 41 with a certain pattern on the transparent substrate 40, the material of BM41 can be made of black resin or metal chrome become. Referring to FIG. 11B , then, a color-resist layer 42 of a certain thickness is formed on the transparent substrate 40 with BM41, exposed using the mask plate 50 shown in FIG. 11C , and the pattern of the red color-resist layer after development is shown in FIG. 11D , repeating the manufacturing process shown in FIG. 11B to FIG. 11D to sequentially form red (R), green (G) and blue (B) color-resist layers as shown in FIG. 11E .

[0076] Again, a flat layer 43 with a certain thickness is formed on the three-layer color resist layer 42, as shown in FIG. 11F , the ...

Embodiment 3

[0081] In the process of using photolithography to manufacture the upper substrate 20, within the range of the sub-filter area, the color-resist layer 42 of the upper substrate 20 is prepared by using the micro-shift mask 53 and multiple exposures, so as to realize the same sub-filter area The thickness of the color resist layer 42 is different, for example, the thickness of the color resist in one part of the region is 2 microns, and the thickness of the color resist in another part of the region is 1.5 microns. The difference between the mask plate 53 of this embodiment and the traditional mask plate 50 is that the light-transmitting part of the mask plate 50 is the entire sub-filtering area, and the light-transmitting part of the mask plate 53 is 1 / 2 sub-filtering area. light area. Taking the red sub-filter area as an example, when forming the sub-filter area of ​​the red color resist, firstly, 1 / 2 of the sub-filter area is exposed with the exposure amount X, and then the m...

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Abstract

A liquid crystal display device of multi-domain vertically-oriented mode is prepared as packing a liquid crystal layer between top and bottom base plates, forming common electrode with slit on surface of top base plate, setting multiple sub-pixel region in display region of bottom base plate, arranging pixel electrode with slit in sub-pixel region, dividing said sub-pixel region to be two regions with certain area and setting gap between common electrode and pixel electrode on at least two regions are different from each other.

Description

technical field [0001] The invention relates to a liquid crystal display device, in particular to a liquid crystal display device in a multi-domain vertical alignment mode capable of improving color aberration and a method for manufacturing the substrate thereof. Background technique [0002] Liquid Crystal Display (LCD) is one of the mainstream display technologies widely used at present, and has the characteristics of low power consumption, thin thickness, light weight and low operating voltage. A liquid crystal display panel generally includes an upper substrate, a lower substrate, and a liquid crystal layer filled between the upper and lower substrates; the display area on the lower substrate includes a plurality of sub-pixel areas, in which thin-film transistors (TFTs) and pixel electrodes are arranged, and the thin-film transistors act as Switching elements; the upper substrate has a common electrode (except for IPS liquid crystal display mode) and a color filter; ther...

Claims

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Application Information

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IPC IPC(8): G02F1/1333G02F1/137G02F1/139G03F7/00H01L21/027
Inventor 马骥曹文一
Owner 上海广电光电子有限公司
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