Film forming device, film forming method, and method of producing organic el element

A film-forming device and film-forming method technology, applied in the direction of electrical components, electroluminescent light sources, semiconductor/solid-state device manufacturing, etc., can solve the problems of not being able to obtain film-forming patterns, spend manufacturing time, and waste time, and achieve shortened production Interval time, shortened manufacturing time, effect of shortened manufacturing time

Inactive Publication Date: 2007-12-19
MITSUI ENG & SHIPBUILD CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When the opening pattern is deformed, there is a problem that the correct film formation pattern cannot be obtained on the substrate
[0006] In addition, when the mask is separated from the substrate, even if the magnet moves away from the substrate to weaken the influence of the magnetic force acting on the mask, if the magnet is moved without restriction, there is a problem that it takes time for this movement.
In particular, in the manufacture of organic EL (Electroluminescence: electroluminescence) elements, shortening of the manufacturing time is required in order to increase the throughput, and therefore, there is a problem that the resulting manufacturing time is spent when the magnet is moved indefinitely.

Method used

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  • Film forming device, film forming method, and method of producing organic el element
  • Film forming device, film forming method, and method of producing organic el element
  • Film forming device, film forming method, and method of producing organic el element

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Embodiment Construction

[0035] Next, preferred embodiments of the film forming apparatus, film forming method, and method for manufacturing an organic EL (electroluminescence) element of the present invention will be described. In addition, in this embodiment, a mode in which an organic EL element is manufactured using a vacuum vapor deposition device as a film forming device will be described.

[0036] FIG. 1 is an explanatory diagram of an upper mechanism of a vacuum vapor deposition apparatus according to an embodiment. Fig. 2 is an explanatory diagram of a vacuum evaporation device. The vacuum evaporation apparatus 10 is provided at its bottom with an evaporation source 14 (supply source) of an organic material 12 and at its upper portion with an apparatus upper mechanism 16 . The apparatus upper mechanism 16 is a structure including a chuck 18 , a magnet arrangement plate 20 having a magnet 22 , a movement restricting device 24 , a substrate holder 26 , and a mask holder 28 .

[0037] The evap...

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Abstract

A film forming device has a source for feeding a film forming material and a substrate on which a film of the film forming material is formed. The film forming device is constructed from a mask (36) provided on the front side of the substrate so as to be movable in a direction approaching and leaving the front surface of the substrate; a magnet (22) provided on the rear side of the substrate so as to be movable in a direction approaching and leaving the rear side of the substrate; and a movement limitation means (24) for limiting the movement of the magnet (22) within a predetermined range.

Description

technical field [0001] The invention relates to a film forming device, a film forming method and a manufacturing method of an organic electroluminescent (EL) element. Background technique [0002] A film forming apparatus for forming a predetermined pattern on a substrate includes: a chuck for holding the substrate in a planar shape, a mask formed of a magnetic material forming a predetermined opening pattern, and a device for fixing the mask on the substrate. magnet. Furthermore, at the time of film formation, the substrate is mounted and held on the surface of the chuck, and the mask is covered on the substrate. The mask is held on the substrate by the magnetic force of a magnet placed on the back of the chuck. [0003] Next, in Patent Document 1 disclosed regarding a thin film forming apparatus, it is described that by keeping the permanent magnet away from the substrate when the mask is fixed on the substrate, and bringing the permanent magnet close to the substrate af...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/24C23C14/04H01L51/50H05B33/10
CPCH01L51/56H01L51/0011C23C14/042Y02E10/549Y02P70/50H10K71/166H10K71/00C23C14/24C23C14/243C23C14/246H01L21/02678H10K77/10H10K50/11
Inventor 片冈达哉长尾兼次齐藤谦一
Owner MITSUI ENG & SHIPBUILD CO LTD
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