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Device for treating flat fragile substrate

A substrate and flat technology, which is applied in the field of devices for processing flat and fragile substrates, can solve the problems of complex configuration of the opposing holding device and the like

Inactive Publication Date: 2011-07-13
HOLLMULLER MASCHENBAU
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But here the configuration of the opposing holding device is very complicated

Method used

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  • Device for treating flat fragile substrate
  • Device for treating flat fragile substrate
  • Device for treating flat fragile substrate

Examples

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Embodiment Construction

[0025] As an example of "processing" in the sense of interest here, an application from the solar industry is illustrated below:

[0026] For the production of solar cells, silicon plates with a thickness of approximately 0.2 mm are used which have vapor-deposited or screen-printed thin metallic conductor strips (Leiterzug) on ​​the later "solar active" side . The conductor tracks must be reinforced / thickened by electroplating to a layer thickness of 1 to 20 μm. The strengthening material can be copper, tin, silver or gold. On the opposite side of the base body are the contact surfaces required for this, for example in the form of contact strips and / or contact windows, which are electrically conductively connected to the vapor-deposited or screen-printed electrical conductor strips on the "solar active" side .

[0027] figure 1 A device is shown, designated generally by the reference numeral 1, with which such vapor-deposited conductor tracks on a silicon substrate can be ...

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Abstract

The invention relates a device (1) for treatment flat fragile substrate(2), the said substrate (2) being subjected with a treatment fluid (4) in a treatment chamber. The said substrate moves along multi parallel tracks by conveying device (3) through the treatment chamber. At least one of opposite holding devices (7,22) acts on one upward side of the substrate (2) to prevent the substrate(2) frombeing raised from the conveying device (3). A number of opposite holding devices (7,22) are fixed on a common axes (22) which crossovers different tracks, namely, the said holding devices can independently move along vertical direction, and exert pressure independent of thickness of the substrates on the substrates (2).

Description

technical field [0001] The invention relates to a device for processing flat, fragile substrates, especially for the semiconductor industry and the solar industry, comprising: [0002] a) a treatment chamber in which the treatment liquid can be used to load the substrate; [0003] b) a conveying device with which the substrate can be guided horizontally through the treatment chamber along a plurality of mutually parallel trajectories; [0004] c) at least one opposing retaining device acting on the upwardly facing side of the substrate to prevent it from being lifted from the conveying device and comprising a through (full length) spanning (disposed) over multiple A shaft on a trajectory (Spur) on which a plurality of opposing holding elements are fixed. Background technique [0005] In the semiconductor industry and the solar industry, very flat substrates such as silicon wafers (wafers), silicon plates and glass plates are frequently used, to which substrates must be sub...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/00H01L21/67H01L21/687H01L21/677B65G49/05B65G49/06B65G49/07
CPCC25D7/0614C25D17/00C25D17/005C25D17/06C25D17/001
Inventor T・科西科夫斯基
Owner HOLLMULLER MASCHENBAU
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